Abstract: Provided is a polymerizable composition including: (a) a polymerizable component; and (b) a pigment component the pigment component includes: (i) an ionic or amphoteric dispersant material; and (ii) pigment nanoparticles uniformly dispersed in the dispersant material (i). The nanoparticles have a particle size of up to 500 nanometers. Also provided is a polymerizable composition of: (a) a polymerizable component including: (i) diethylene glycol bis(allyl carbonate); and (ii) a radical initiator; and (b) a pigment component which includes: (i) an ionic or amphoteric dispersant material derived from polycaprolactone; and (ii) pigment nanoparticles of ultramarine blue having an average particle size of up to 500 nanometers, uniformly dispersed in the dispersant material.

Abstract: Provided is a polymerizable composition including: (a) a polymerizable component; and (b) a pigment component the pigment component includes: (i) an ionic or amphoteric dispersant material; and (ii) pigment nanoparticles uniformly dispersed in the dispersant material (i). The nanoparticles have a particle size of up to 500 nanometers. Also provided is a polymerizable composition of: (a) a polymerizable component including: (i) diethylene glycol bis(allyl carbonate); and (ii) a radical initiator; and (b) a pigment component which includes: (i) an ionic or amphoteric dispersant material derived from polycaprolactone; and (ii) pigment nanoparticles of ultramarine blue having an average particle size of up to 500 nanometers, uniformly dispersed in the dispersant material.

Abstract: Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula wherein R1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds.

Abstract: Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sub.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds.

Abstract: Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sup.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds.

Abstract: A method for coating a moving substrate provides a coating having a chemical composition which varies continuously from the interface with the substrate to the opposite surface of the coating. The method involves directing a vapor coating composition toward a substrate surface and moving portions of the vapor in opposite directions. A vapor coating mixture may include a tin-containing precursor and a silicon-containing precursor. An accelerant, e.g. a phosphorus-containing precursor, may be used with the metal-containing precursors to increase the deposition rate of the coating. The coating deposited on the substrate has regions of continuously varying weight percent of silicon oxide and tin oxide as the distance from the substrate-coating interface increases, with the surface of the coating farthest from the substrate-coating interface being predominantly tin oxide.

Abstract: A coated article and method of producing it are disclosed wherein the iridescence caused by the difference between the refractive index of a transparent substrate and the refractive index of a metal oxide coating is reduced by means of two intermediate layers, the first of which, closest to the substrate, has a refractive index higher than the refractive index of the substrate but lower than the refractive index of the second, and the second has a refractive index higher than the refractive index of the first but lower than the refractive index of the metal oxide coating. The thicknesses of the two intermediate layers for optimizing a neutral appearance are determined by the thickness and refractive index of the metal oxide coating.

Abstract: An apparatus for coating a glass ribbon has an exhaust on each side of a coating unit at different distances therefrom. With this arrangement, portions of the ribbon upstream and downstream of the coating unit are exposed to coating vapors from the coating unit for different periods of time. A coating mixture includes tin containing precursors and a silicon containing precursor. The silicon containing precursor has the structural formula ##STR1## where R.sub.1 is a group which does not have an oxygen available to form a peroxide, R.sub.2 is a functional group giving the silicon containing precursor the ability to be easily converted to silicon oxide coating, R.sub.3 is a bridging group to provide for multiple silicon atoms and R.sub.4 completes the bonding on the foundation silicon atom. An accelerant e.g. a phosphorus containing precursor may be used with the metal containing precursors to increase the deposition rate of the coating.