Patents by Inventor Ru Chiang

Ru Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming novel BARC open for precision critical dimension control
    Publication number: 20050153538
    Abstract: A method for forming an opening in a semiconductor device is provided. In one embodiment, a bottom anti-reflective coating (BARC) layer is formed overlying an insulation layer of a substrate. A patterned photoresist layer including at least one opening therein is formed overlying the BARC layer.
    Type: Application
    Filed: January 9, 2004
    Publication date: July 14, 2005
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming Tsai, Ru Chiang, Hun Tao