Patents by Inventor Ru Jong Jeng

Ru Jong Jeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140135451
    Abstract: A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: January 23, 2014
    Publication date: May 15, 2014
    Applicant: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Publication number: 20130131301
    Abstract: Disclosed is a method for making waterborne polyurethane with a reactive functional group. The method includes the step of introducing a short-chain diol monomer with a reactive functional group into waterborne polyurethane polymer by pre-polymerization to provide a polyurethane pre-polymer with the reactive functional group connected to a side chain and the step of reacting the pre-polymer with hydrophilic diamine for chain extension and inter-crosslink to provide waterborne polyurethane with different crosslink degree.
    Type: Application
    Filed: March 14, 2012
    Publication date: May 23, 2013
    Applicant: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Shi-Min Shau, Sheng-hong Dai, Ru-Jong Jeng
  • Patent number: 8318889
    Abstract: An organic polyurethane shape memory material includes a C10 chain or C18 chain and consists of hard segment and soft segment. The material is produced by reacting the single-chain type dendrimer with diethylenetriamine to produce dendrimer. Then dendrimer reacts with N-(3-aminopropyl)diethanolamine to produce dendritic diols. Next, polymer HO(C6H10O2)xC2H4OC2H4(C6H10O2)yOH, where x+y=25˜26, reacts with methylenedi-p-phenyl diisocyanate, and at least one type of dendritic diols is added to produce the organic polyurethane shape memory material.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: November 27, 2012
    Assignee: Chung Shan Institute of Science and Technology, Armaments Bureau, M.N.D.
    Inventors: Wen-Chiung Su, Cheng-Che Tsai, Ching-Shiang Yu, Shenghong A Dai, Ru-Jong Jeng
  • Publication number: 20120130022
    Abstract: A method for making a side-chain dendrimer vesicle includes the following steps. At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: May 7, 2011
    Publication date: May 24, 2012
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Patent number: 8173760
    Abstract: Methods for producing dendrons of different generations with hydrophobic functional end-groups, and for producing polyurethanes with the side-chain dendrons are disclosed step-by-step. The dendron with hydrophobic functional end-groups in the polyurethane systems, and the honeycomb-like structure thin films are obtained by a breath-figure process. The structures of dendrons and dendritic side-chain polyurethanes are respectively expressed in the following and the end-groups (R) of the dendron are long alkyl chains or perfluoroalkyl derivatives.
    Type: Grant
    Filed: February 28, 2010
    Date of Patent: May 8, 2012
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Chun-Ming Yeh, Chia-Cheng Chang, Sheng-Hong Dai, Ru-Jong Jeng
  • Publication number: 20110213114
    Abstract: A dendron with hydrophobic functional of end group, a polyurethane with the dendron, and producing methods thereof are disclosed. The dendron with hydrophobic functional of end group in the polyurethane systems, and the honeycomb-like structure thin films were obtained by a breath-figure process. The structures of dendron and dendritic side-chain polyurethanes are respectively expressed in the following. Therein, the end-groups (R) of the dendron are long alkyl chains or perfluoroalkyl derivatives.
    Type: Application
    Filed: February 28, 2010
    Publication date: September 1, 2011
    Inventors: WEN-CHIUNG SU, Wei-Ho Ting, Chun-Ming Yeh, Chia-Cheng Chang, Sheng-Hong Dai, Ru-Jong Jeng
  • Patent number: 7981980
    Abstract: The invention discloses a cross-linked epoxy resin with flame-retardant properties and method for producing the same. The polymeric material of the invention includes an epoxy resin, a curing agent and a modification agent. Particularly, the modification agent is a derivative of 9,10-Dihydro-9-oxa-10-phosphaphenanthrene 10-oxide (DOPO). Moreover, the curing agent is 4,4?-diaminodiphenyl methane (DDM), or tris(4-aminophenyl)amine (NNH).
    Type: Grant
    Filed: January 23, 2011
    Date of Patent: July 19, 2011
    Assignee: Chung-Shan Institute of Science and Technology Armaments Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Chun-Ku Liu, Ru-Jong Jeng, Shenghong A. Dai, Ching-Hsuan Lin
  • Publication number: 20110118423
    Abstract: The invention discloses a cross-linked epoxy resin with flame-retardant properties and method for producing the same. The polymeric material of the invention includes an epoxy resin, a curing agent and a modification agent. Particularly, the modification agent is a derivative of 9,10-Dihydro-9-oxa-10-phosphaphenanthrene 10-oxide (DOPO). Moreover, the curing agent is 4,4?-diaminodiphenyl methane (DDM), or tris(4-aminophenyl)amine (NNH).
    Type: Application
    Filed: January 23, 2011
    Publication date: May 19, 2011
    Inventors: WEN-CHIUNG SU, Chun-Ku Liu, Ru-Jong Jeng, Shenghong A. Dai, Ching-Hsuan Lin
  • Patent number: 7897702
    Abstract: The invention discloses a novel cross-linked epoxy resin with flame-retardant properties and method for producing the same. The polymeric material of the invention includes an epoxy resin, a curing agent and a modification agent. Particularly, the modification agent is a derivative of 9,10-Dihydro-9-oxa-10-phosphaphenanthrene 10-Oxide (DOPO). Moreover, the curing agent is 4,4?-diaminodiphenyl methane (DDM), or tris(4-aminephenyl)amine (NNH).
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: March 1, 2011
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Chun-Ku Liu, Ru-Jong Jeng, Shenghong A. Dai, Ching-Hsuan Lin
  • Publication number: 20100130698
    Abstract: The invention discloses a novel cross-linked epoxy resin with flame-retardant properties and method for producing the same. The polymeric material of the invention includes an epoxy resin, a curing agent and a modification agent. Particularly, the modification agent is a derivative of 9,10-Dihydro-9-oxa-10-phosphaphenanthrene 10-Oxide (DOPO). Moreover, the curing agent is 4,4?-diaminodiphenyl methane (DDM), or tris(4-aminephenyl)amine (NNH).
    Type: Application
    Filed: November 24, 2008
    Publication date: May 27, 2010
    Inventors: WEN-CHIUNG SU, Chun-Ku Liu, Ru-Jong Jeng, Shenghong A. Dai, Ching-Hsuan Lin
  • Publication number: 20100113686
    Abstract: The present invention relates to a one-pot synthetic method for synthesizing silver-containing waterborne polyurethane (WBPU). The method includes the steps of adding a silver ion-containing solution, such as silver nitrate solution, into WBPU emulsion to form a silver-containing PU emulsion by stirring, and dehydrating the silver-containing PU emulsion so as to obtain a WBPU containing nano-scaled silver particles having a uniform particle size and good dispersibility. The present invention provides a method that can be easily and speedily operated, and the silver-containing WBPU prepared according to the method of the present invention exhibits excellent antibacterial, bactericidal and deodorant effects but using a small amount of silver.
    Type: Application
    Filed: November 4, 2008
    Publication date: May 6, 2010
    Inventors: Wei-Ho Ting, Shenghong A. Dai, Tzu-Wen Kuo, Ru-Jong Jeng
  • Publication number: 20090048418
    Abstract: An organic polyurethane shape memory material and a preparation method thereof are disclosed. The organic polyurethane shape memory material includes a C10 chain or C18 chain and it consists of hard segment and soft segment. The preparation method thereof includes the steps of: The single-chain type dendrimer reacts with diethylenetriamine to produce multiple chains type dendrimer. And then at least one type dendrimer reacts with N-(3-aminopropyl)diethanolamine to produce at least one type dendritic diols. Next polymer HO(C6H10O2)xC2H4OC2H4(C6H10O2)yOH, x+y=25˜26 reacts with methylenedi-p-phenyl diisocyanate and then at least one type dendritic diols is added to react so as to get organic polyurethane shape memory material. The material of the present invention overcomes shortcoming of metal alloy and ceramic such as poor processability, difficulty in modification and high cost. Moreover, it also increase mechanical properties of polymer.
    Type: Application
    Filed: August 17, 2007
    Publication date: February 19, 2009
    Inventors: Wen-Chiung Su, Cheng-Che Tsai, Ching-Shiang Yu, Shenghong A. Dai, Ru-jong Jeng
  • Publication number: 20030162934
    Abstract: The present invention discloses phosphorus-containing epoxy monomers of formula (I), 1
    Type: Application
    Filed: January 15, 2002
    Publication date: August 28, 2003
    Applicant: Chung Shan Institute of Science & Technology
    Inventors: Wen-Chiung Su, Jiang-Jen Lin, Jun-Ren Wang, Shi-Min Shau, Ru-Jong Jeng
  • Patent number: 6503998
    Abstract: The present invention provides a lambda-shaped carbazole based chromophore, and a main-chain NLO polyurethane containing the same. The lambda-shaped structure reduces the plasticization to the main-chain polymers caused by the chromophore and increases temporal stability of the NLO coefficients of the main-chain NLO polyurethane. The NLO coefficients of the main-chain NLO polyurethane are stable because the efficiency of dipole alignment in electric field is increased due to the dipole thereof being perpendicular to the main chain of the polyurethane.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: January 7, 2003
    Assignee: National Science Council
    Inventors: Ging-Ho Hsiue, Wen-Jang Kuo, Ru-Jong Jeng
  • Publication number: 20020115869
    Abstract: The present invention provides a lambda-shaped carbazole based chromophore, and a main-chain NLO polyurethane containing the same. The lambda-shaped structure reduces the plasticization to the main-chain polymers caused by the chromophore and increases temporal stability of the NLO coefficients of the main-chain NLO polyurethane. The NLO coefficients of the main-chain NLO polyurethane are stable because the efficiency of dipole alignment in electric field is increased due to the dipole thereof being perpendicular to the main chain of the polyurethane.
    Type: Application
    Filed: September 5, 2001
    Publication date: August 22, 2002
    Inventors: Ging-Ho Hsiue, Wen-Jang Kuo, Ru-Jong Jeng
  • Patent number: 6294593
    Abstract: Crosslinkable polymers which can exhibit second order nonlinear optical properties and methods of forming and crosslinking such polymers are disclosed. The crosslinkable polymers are combined with a crosslinking agent. Optionally, the crosslinking agent can exhibit second order nonlinear optical properties. In one embodiment, the crosslinking agent is thermally reactive. Alternatively the crosslinking agent is photoreactive. The combined polymer and crosslinking agent are exposed to an electric field which is sufficient to cause a component of the polymer which can exhibit second order nonlinear optical properties to be poled. The polymer is then crosslinked by the crosslinking agent. The crosslinking agent can be a guest compound that is-covalently bound to the polymer, which operates as a host compound.
    Type: Grant
    Filed: October 28, 1992
    Date of Patent: September 25, 2001
    Assignee: University of Massachusetts Lowell
    Inventors: Ru Jong Jeng, Jayant Kumar, Braja K. Mandal, Sukant Kishore Tripathy
  • Patent number: 5676883
    Abstract: A nonlinear optical composition and a method of forming the nonlinear optical composition are disclosed. The nonlinear optical composition includes a silicon-containing component and a nonlinear optical component which causes the nonlinear optical composition to exhibit second order nonlinear optical polarization of electromagnetic radiation, such as light. The method includes forming a sol of the silicon-containing component and the nonlinear optical component of the composition. A gel is formed from the sol. The nonlinear optical component is then poled while the gel is exposed to conditions sufficient to cause formation of a nonlinear optical composition which exhibits second order nonlinear optical polarization of electromagnetic radiation.
    Type: Grant
    Filed: May 24, 1995
    Date of Patent: October 14, 1997
    Assignee: University of Massachusetts Lowell
    Inventors: Ru Jong Jeng, Yong Ming Chen, Aloke Kumar Jain, Jayant Kumar, Sukant Kishore Tripathy
  • Patent number: 5532320
    Abstract: A nonlinear optical interpenetrating polymer network which can exhibit nonlinear optical properties includes a first polymer, and a second polymer interpenetrating the first polymer. At least one of the polymers includes a nonlinear optical component. A method of forming a nonlinear optical interpenetrating polymer network which can exhibit nonlinear optical properties includes combining a first prepolymer, which can react to form a first polymer, with at least one monomer which can react to form a second polymer. At least one of either the first prepolymer or the monomer include a nonlinear optical component. The nonlinear optical component is poled and the first prepolymer and the monomer, or monomers, of the second prepolymer are reacted while the nonlinear optical component is being poled.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: July 2, 1996
    Assignee: University of Massachusetts Lowell
    Inventors: Sukant K. Tripathy, Ru-Jong Jeng, Jayant Kumar, Sutiyao Marturunkakul, Jeng-I Chen