Patents by Inventor Ruben WALDMAN

Ruben WALDMAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Filtration membranes
    Patent number: 11896935
    Abstract: Polymeric membranes are modified via SIS to promote membrane resilience, prolong membrane lifetime, and mitigate fouling. Modified membranes include an inorganic material within an outer portion of the modified membrane and a polymeric core that remains unmodified by the inorganic material. The polymer may be removed leaving an inorganic material patterned from an initial unmodified polymeric membrane.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: February 13, 2024
    Assignees: UCHICAGO ARGONNE, LLC, UNIVERSITY OF CHICAGO
    Inventors: Seth B. Darling, Jeffrey W. Elam, Ruben Waldman
  • Systems and methods for oleophobic composite membranes
    Patent number: 11590456
    Abstract: Atomic layer deposition is utilized to deposit a coating on a membrane. The coated membrane exhibits a tightly bound hydration layer upon exposure to water. The resultant coated membrane is oleophobic.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: February 28, 2023
    Assignees: UChicago Argonne, LLC, The University of Chicago
    Inventors: Hao-Cheng Yang, Seth B. Darling, Jeffrey W. Elam, Lin Chen, Ruben Waldman
  • SEQUENTIAL INFILTRATION SYNTHESIS OF GROUP 13 OXIDE ELECTRONIC MATERIALS
    Publication number: 20210017649
    Abstract: The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In2O3 and Ga2O3) into polymethyl methacrylate (PMMA) thin films is demonstrated. Examples highlight the an SIS process using trimethylindium (TMIn) and trimethylgallium (TMGa), respectively, with water. In situ Fourier transform infrared (FTIR) spectroscopy reveals that these metal alkyl precursors reversibly associate with the carbonyl groups of PMMA in analogy to trimethylaluminum (TMAl), however with significantly lower affinity. SIS with TMIn and water enables the growth of In2O3 at 80° C., well below the onset temperature of atomic layer deposition (ALD) using these precursors.
    Type: Application
    Filed: July 18, 2019
    Publication date: January 21, 2021
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Alex B. Martinson, Seth B. Darling, Ruben Waldman
  • SYSTEMS AND METHODS FOR OLEOPHOBIC COMPOSITE MEMBRANES
    Publication number: 20190366273
    Abstract: Atomic layer deposition is utilized to deposit a coating on a membrane. The coated membrane exhibits a tightly bound hydration layer upon exposure to water. The resultant coated membrane is oleophobic.
    Type: Application
    Filed: May 31, 2018
    Publication date: December 5, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Hao-Cheng Yang, Seth B. Darling, Jeffrey W. Elam, Lin Chen, Ruben Waldman
  • JANUS MEMBRANES VIA ATOMIC LAYER DEPOSITION
    Publication number: 20190345397
    Abstract: A Janus membrane exhibiting sides with different properties and methods of fabricating such a Janus membrane. The membrane comprises a polymer material lacking polar functional groups. One side of the membrane is masked during atomic layer deposition (ALD). ALD is utilized to deposit a conformal coating on an exposed side of the membrane.
    Type: Application
    Filed: May 11, 2018
    Publication date: November 14, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Ruben Waldman, Hao-Cheng Yang, Seth B. Darling
  • FILTRATION MEMBRANES
    Publication number: 20190054426
    Abstract: Modification of polymeric membranes via SIS to promote membrane resilience, prolong membrane lifetime, and mitigate fouling. Membranes include an inorganic material in the surface and a polymeric core. The polymer may be removed leaving an inorganic material patterned from an initial polymeric membrane.
    Type: Application
    Filed: August 17, 2017
    Publication date: February 21, 2019
    Inventors: Seth B. DARLING, Jeffrey W. ELAM, Ruben WALDMAN