Patents by Inventor RUDI KOETTER

RUDI KOETTER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma corridor for high volume PE-CVD processing
    Patent number: 10900117
    Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 26, 2021
    Assignee: VAPOR TECHNOLOGIES, INC.
    Inventors: Vladimir Gorokhovsky, Ganesh Kamath, Bryce Anton, Rudi Koetter
  • PLASMA CORRIDOR FOR HIGH VOLUME PE-CVD PROCESSING
    Publication number: 20200131621
    Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.
    Type: Application
    Filed: October 24, 2018
    Publication date: April 30, 2020
    Inventors: VLADIMIR GOROKHOVSKY, GANESH KAMATH, BRYCE ANTON, RUDI KOETTER