Patents by Inventor Rudolf A. Heinecke

Rudolf A. Heinecke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pulsed plasma apparatus and process
    Patent number: 4935661
    Abstract: An apparatus for pulsed plasma treatment of a substrate surface includes means for removing spent gas from a region adjacent the substrate for each pulse. The apparatus may also include means for sweeping an intense plasma region across a substrate surface. Rapid gas exchange is provided by pressure pulsing the gas admission. This facility also provides means for rapidly alternating different gases.
    Type: Grant
    Filed: June 26, 1986
    Date of Patent: June 19, 1990
    Assignee: STC plc
    Inventors: Rudolf A. Heinecke, Sureshchandra M. Ojha, Ian P. Llewellyn