Patents by Inventor Rudolf August Herbert Heinecke

Rudolf August Herbert Heinecke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selective plasma etching and deposition
    Patent number: 3940506
    Abstract: This invention relates to a method of selectively treating the surface of an article comprising silicon in part and either silica or silicon nitride in part wherein either the silicon or the silicon compound is etched at a greater rate or a fluoropolymer is deposited on the article by placing the article in a plasma containing fluorine, carbon and reducing species and adjusting the concentration of the reducing species to selectively etch the silicon at a greater rate, etch the silicon compound at a greater rate or deposit polymer.
    Type: Grant
    Filed: May 3, 1974
    Date of Patent: February 24, 1976
    Assignee: ITT Industries, Inc.
    Inventor: Rudolf August Herbert Heinecke