Abstract: A digital lithography system includes a stage configured to support a substrate, a bridge disposed above the stage, and a first lithographic processing unit coupled to the bridge. The first lithographic processing unit coupled to the bridge can include a scanning unit, a lithographic exposure unit, and an optical system shared by the scanning unit and the lithographic exposure unit. The scanning unit is to use the optical system to generate measurements of the substrate during a measurement operation, and the lithographic exposure unit is to use the optical system to perform digital lithographic exposure of the substrate using the optical system during an exposure operation.

Abstract: Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IRS's). The IRS's are in a processing positon prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.

Abstract: A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras.