Abstract: The present invention relates to a radiation-polymerizable mixture which includes a polymerizable compound, a polymeric binder which has units of methacrylic acid, a methacrylic acid ester and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment on a silicic acid or silicate basis, a photopolymerization initiator, a compound having at least two epoxy groups in its molecule and a thermal hardener for epoxy groups. The mixture is advantageous, in particular, for producing solder masks and can be cured after exposure to an image and development by heating to about 80.degree. to 150.degree. C. to form a stencil which is resistant under soldering conditions.

Abstract: The present invention relates to a radiation-polymerizable mixture which includes a polymerizable compound, a polymeric binder which has units of methacrylic acid, a methacrylic acid ester and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment on a silicic acid or silicate basis, a photopolymerization initiator, a compound having at least two epoxy groups in its molecule and a thermal hardener for epoxy groups. The mixture is advantageous, in particular, for producing solder masks and can be cured after exposure to an image and development by heating to about 80.degree. to 150.degree. C. to form a stencil which is resistant under soldering conditions.

Abstract: A radiation-polymerizable mixture comprising a compound having at least two terminal ethylenically unsaturated groups which can form a crosslinked polymer by means of free-radical initiated addition polymerization, a polymeric binder, a radiation activatable polymerization initiator, and a compound having two epoxy groups in the molecule and a molecular weight of not more than 1,500; and a photopolymerizable copying material having a flexible transparent temporary support and a transferrable thermoplastic photopolymerizable layer comprising the above-described radiation-polymerizable mixture.

Abstract: A polyurethane corresponding to the formula: ##STR1## wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group,X is one of the groups --O--Ph--Z--Ph--O-- and --OOC--(CH.sub.2).sub.y --COO--,Ph being an optionally substituted phenylene group,Z being an alkylene group having 1--4 carbon atoms andy being a number from 2 to 12,R is a hydrogen atom or a methyl group,Y is an alkylene radical having 2-6 carbon atoms,m is an integer from 4 to 50n is an integer from 1 to 6 ando is an integer from 4 to 20having the properties of thermolasts and being hardenable to give elastic products. It is suitable for use as a hardenable constituent of photopolymerizable materials.

Abstract: A polyurethane corresponding to the formula: ##STR1## wherein Q is a divalent, mononuclear or dinuclear aromatic radial which is unsubstituted or is substituted by lower alkyl groups and which can contain, as a linking member, a lower alkylene group,X is one of the groups --O--Ph--Z--Ph--O-- and --OOC--(CH.sub.2).sub.y --COO--,Ph being an optionally substituted phenylene group,Z being an alkylene group having 1-4 carbon atoms and y being a number from 2 to 12,R is a hydrogen atom or a methyl group,Y is an alkylene radical having 2-6 carbon atoms,m is an integer from 4 to 50n is an integer from 1 to 6 ando is an integer from 4 to 20having the properties of thermoplasts and being hardenable to give elastic products. It is suitable for use as a hardenable constituent of photopolymerizable materials.