Abstract: Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the formula II and/or III ##STR2## in which Z and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine, are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.

Abstract: Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the formula II and/or III ##STR2## in which Z and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine, are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.

Abstract: Anthraquinones of formula I ##STR1## wherein X is the group --CR.sup.2 R.sup.3 --, where R.sup.2 is H, --CN or C.sub.1 -C.sub.5 -alkyl and R.sup.3 is H or --CN, R.sup.1 is H or C.sub.1 -C.sub.5 -alkyl and R is a direct bond or linear or branched C.sub.1 -C.sub.18 -alkylene which, alone or together with the --CR.sup.2 R.sup.3 -- group, can be interrupted by one or more --O-- when R.sup.2 and/or R.sup.3 are not --CN, and curable compositions comprising (a) an epoxy resin, (b) a hardener if necessary, (c) an anthraquinone of formula I and (d) an amino alcohol. The cured compositions are photosensitive and are suitable for the preparation of coatings and metallic images by electroless metal deposition.

Abstract: Compounds containing at least 5 mol % of structural units of the formulae I and/or II ##STR1## in which Q is an unsubstituted or substituted tetravalent aromatic radical to which in each case two carbonyl groups are bonded in the ortho- or peri-position, R.sup.1 is selected from the radicals of the formulae III, IV and V ##STR2## R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are hydrogen, alkyl, cycloalkyl or substituted or unsubstituted aryl or aralkyl, R.sup.6 and R.sup.7 are aryl or halogen, m and n are 0, 1 or 2 and o is 0, 1, 2, 3 or 4, are described.The compounds are distinguished by an increased resistance to oxidation by heat. They can be used to produce coatings and relief structures.

Abstract: Compounds of the forulae I and Ia ##STR1## in which R.sup.1 is a group which can be transferred to carbonyl or imine compounds, for example alkyl, allyl, vinyl or the radical of an enol or enamine, R.sup.2 is, for example, cyclopentadienyl, R.sup.3 is the radical of an optically active sugar or sugar derivative, Me is Ti, Zr or Hf, x is 0, 1 or 2 and y is 0, 1, 2 or 3, M.sym. is Li.sym., Na.sym., K.sym., MgY.sym., ZnY.sym., CdY.sym., HgY, CuY.sym. or quaternary ammonium, Y being halogen, are suitable for use as chiral reactants for compounds containing aldehyde, keto and/or N-substituted imine groups.

Abstract: Homo- and copolycondensates selected from the group consisting of linear saturated polyamides, polyesters and polyester amides derived from dicarboxylic acids of formula IV ##STR1## wherein Z is a direct bond, methylene, --O--, --S--, --SO--, --SO.sub.2, --CO--, --NH-- or alkylidene, R.sup.1 and R.sup.2 are independently alkyl, halogen, cyano, nitro, alkoxy, phenoxy or benzyl, and m and n are independently 0 to 3, are radiation-sensitive and are particularly suitable for the production of protective coatings and relief images.

Abstract: Homo- and copolycondensates selected from the group consisting of linear saturated polyamides, polyesters and polyester amides derived from dicarboxylic acids of formula IV ##STR1## wherein Z is a direct bond, methylene, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --NH-- or alkylidene, R.sup.1 and R.sup.2 are independently alkyl, halogen, cyano, nitro, alkoxy, phenoxy or benzyl, and m and n are independently 0 to 3, are radiation-sensitive and are particularly suitable for the production of protective coatings and relief images.

Abstract: Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the fomula II and/or III ##STR2## in which and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.