Abstract: A hybrid organic-inorganic solar cell is provided that includes a substrate, a transparent conductive oxide (TCO) layer deposited on the substrate, an n-type electron transport material (ETM) layer, a p-type hole transport material (HTM) layer, an i-type perovskite layer, and an electrode layer, where the substrate layers are arranged in an n-i-p stack, or a p-i-n stack, where the passivating barrier layer is disposed between the layers of the (i) perovskite and HTM, (ii) perovskite and ETM, (iii) perovskite and HTM, and perovskite and ETM, or (iv) TCO and ETM, and ETM and perovskite, and perovskite and HTM, or (v) substrate and TCO, and TCO and ETM, and ETM and perovskite, and perovskite layer and HTM, or (vi) a pair of ETM layers, or (vii) a pair of HTM layers.

Abstract: A hybrid organic-inorganic solar cell is provided that includes a substrate, a transparent conductive oxide (TCO) layer deposited on the substrate, an n-type electron transport material (ETM) layer, a p-type hole transport material (HTM) layer, an i-type perovskite layer, and an electrode layer, where the substrate layers are arranged in an n-i-p stack, or a p-i-n stack, where the passivating barrier layer is disposed between the layers of the (i) perovskite and HTM, (ii) perovskite and ETM, (iii) perovskite and HTM, and perovskite and ETM, or (iv) TCO and ETM, and ETM and perovskite, and perovskite and HTM, or (v) substrate and TCO, and TCO and ETM, and ETM and perovskite, and perovskite layer and HTM, or (vi) a pair of ETM layers, or (vii) a pair of HTM layers.

Abstract: A silicon nitride thin film formation apparatus is provided for stationary and moving substrates and a process for forming such films. The process provides high uniformity of film thickness and film properties as well as a high deposition rate. The film properties are adequate for application as an antireflection layer or passivation layer in solar cell devices or as dielectric layer in thin film transistors. The apparatus includes a number of metal filaments. In the space within the formation apparatus opposite to the substrate with respect to the filaments, a gas dosage system is arranged at a predetermined distance of the filaments. The film formation apparatus for stationary substrates also contains a shutter to control the starting and ending conditions for film formation and to control the film thickness.

Abstract: The invention provides solar cells and methods of manufacturing solar cells having a Hetero-junction with Intrinsic Thin-layer (HIT) structure using an n-type multicrystalline silicon substrate. An n-type multicrystalline silicon substrate is subjected to a phosphorus diffusion step using a relatively high temperature. The front side diffusion layer is then removed. As a next step, a p-type silicon thin film is deposited at the front side of the substrate. This sequence avoids heating the p-type silicon thin film above its deposition temperature, and maintains the quality of the p-type silicon thin film.

Abstract: A silicon nitride thin film formation apparatus is provided for stationary and moving substrates and a process for forming such films. The process provides high uniformity of film thickness and film properties as well as a high deposition rate. The film properties are adequate for application as an antireflection layer or passivation layer in solar cell devices or as dielectric layer in thin film transistors. The apparatus includes a number of metal filaments. In the space within the formation apparatus opposite to the substrate with respect to the filaments, a gas dosage system is arranged at a predetermined distance of the filaments. The film formation apparatus for stationary substrates also contains a shutter to control the starting and ending conditions for film formation and to control the film thickness.

Abstract: The invention pertains to a solar cell unit comprising a back electrode, a photovoltaic (PV) layer, and, optionally, a front electrode, with part of the surface of the solar cell unit not generating any energy, characterised in that on at least a portion of the part of the solar cell unit which does not generate any energy a colouring layer is present, while at least a portion of the energy generating part of the solar cell unit is free of a colouring layer. Preferably at least 50%, more preferably, at least 85%, more preferably still, at least 90% of the energy generating part of the solar cell unit is free of a colouring layer. The solar cell unit may be either a wafer-based solar cell unit or a thin film solar cell unit. The colouring layer may be applied on, e.g., the optionally present grid and/or in the case of thin film solar cell units on the part of the surface of the solar cell unit which does not generate any energy as a result of the connection in series.

Abstract: The present invention pertains to a solar cell unit comprising a back electrode, a photovoltaic (PV) layer, and, optionally, a front electrode, with part of the surface of the solar cell unit not generating energy, wherein at least part of the non-energy-generating part of the solar cell unit is provided with a coloring material, while at least part of the energy-generating part of the solar cell unit is free of a coloring material, the color of the coloring material being different from that of the solar cell unit. If so desired, part of the non-energy-generating part of the solar cell unit may be provided with a camouflage material. The present invention makes it possible to select the color impression of the solar cell unit and/or decorate the solar cell unit while the electrical output of the solar cell unit is not affected.

Abstract: The invention pertains to a method of making a photovoltaic cell at least comprising the following layers in the following order: a first electrode layer, a transparent wide band gap semiconductor layer provided with a layer of a photosensitising dye or pigment which in combination with the semiconductor layer has the ability to spatially separate photogenerated electrons from their positive countercharges, a layer of an electrolyte, a catalyst layer, and a second electrode layer. The method is characterized in that the first electrode layer and the semiconductor layer and/or the second electrode layer and the catalyst layer are deposited on a flexible temporary substrate that is removed later on. The electrode or electrodes, which are deposited on the temporary substrate, are transparent. The invention allows the roll-to-roll manufacture of said photovoltaic cell while providing great freedom in selecting the processing conditions.

Abstract: A process for producing a thin film semiconductor solar cell, said solar cell at least comprising: a p-type layer, and an n-type layer, which are deposited on carrier material, wherein the composition of the p-type layer, especially the optical band gap and/or the specific conductivity, and/or the composition of the n-type layer, especially the optical band gap and/or the specific conductivity thereof, are varied on a continuous way in time and/or space, by controlling the composition and/or flow of predetermined gases at the location where the respective semiconductor layer is formed.

Abstract: The invention pertains to a method of manufacturing a photovoltaic foil supported by a carrier and comprising a plurality of photovoltaic layers which together have the ability of generating electric current from incident light, a back-electrode layer on one side adjacent and parallel to the photovoltaic layers, and a transparent conductor layer on the other side of, and adjacent and parallel to the photovoltaic layers, which method comprises the following subsequent steps: providing a temporary substrate, applying the transparent conductor layer, applying the photovoltaic layers, applying the back-electrode layer, applying the carrier, removing the temporary substrate, and, preferably, applying a top coat on the side of the transparent conductor layer.