Patents by Inventor Rudolf Meier

Rudolf Meier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240144146
    Abstract: Example methods and systems are directed to carbon footprint sizing for cloud solutions. An account of the cloud solution provides information related to the expected usage of the cloud solution (e.g., a number of users, a number of processes to be performed, or both). Based on the information, an amount of computing resources (e.g., a number of processor cores, an amount of memory, networking resources, or any suitable combination thereof) to be used for the account is determined. The amount of computing resources is used in conjunction with data about available computing devices to assign computing devices to the account. The carbon emission for the assigned computing devices may be determined based on the power consumption of the computing device, the power usage efficiency of a data center housing the computing device, and a carbon emission intensity for the energy source that provides power to the data center.
    Type: Application
    Filed: October 31, 2022
    Publication date: May 2, 2024
    Inventors: Detlef THOMS, Rudolf Meier
  • Patent number: 11161813
    Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: November 2, 2021
    Assignee: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
  • Publication number: 20200123107
    Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Applicant: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
  • Publication number: 20180319746
    Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.
    Type: Application
    Filed: July 16, 2018
    Publication date: November 8, 2018
    Applicant: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
  • Patent number: 10040762
    Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: August 7, 2018
    Assignee: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
  • Publication number: 20150210828
    Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.
    Type: Application
    Filed: April 3, 2015
    Publication date: July 30, 2015
    Applicant: BASF SE
    Inventors: Hans-Rudolf MEIER, Kai-Uwe SCHOENING, Shrirang Bhikaji HINDALEKAR
  • Patent number: 9045430
    Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: June 2, 2015
    Assignee: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
  • Publication number: 20130053484
    Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.
    Type: Application
    Filed: March 2, 2011
    Publication date: February 28, 2013
    Applicant: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
  • Publication number: 20130041076
    Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.
    Type: Application
    Filed: March 2, 2011
    Publication date: February 14, 2013
    Applicant: BASF SE
    Inventors: Hans-Rudolf Meier, Kai-Uwe Schöning, Shrirang Bhikaji Hindalekar
  • Patent number: 7947831
    Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined within, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: May 24, 2011
    Assignee: BASF SE Ludwigshafen
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster
  • Patent number: 7799951
    Abstract: The instant invention discloses a process for preventing contact discoloration of substrates coming into contact with elastomers and stabilizing elastomers to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation, which comprises incorporating into the elastomers, or applying to these, at least a compound of the formula (I) wherein R1 is C1-C12alkyl, R2 is C1-C12alkyl, or R1 and R2 together with the carbon atom to which they are attached form an unsubstituted or with C1-C4alkyl substituted C5-C12cycloalkyl ring; R3 is hydrogen or —CH2—S(O)m—R5, R4 and R5 independently of each other are unsubstituted or with cyano substituted C5-C18-alkyl; C7-C9phenylalkyl, unsubstituted or with halogen, hydroxyl, cyano or C1-C4alkyl substituted phenyl or naphthyl; benzothiazolyl or —R6—CO2—R7, R6 is C1-C18alkylene, R7 is C1-C18alkyl, and m is 0, 1 or 2.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: September 21, 2010
    Assignee: Ciba Corporation
    Inventors: Michèle Gerster, Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi
  • Patent number: 7790793
    Abstract: A composition containing a) a natural or synthetic polymer and b) one or more compounds of the formula (I), (II) or (III) wherein R1, R2 and R3 or Y1, Y2 and Y3 or Z1, Z2 and Z3 are e.g. branched C3-C20alkyl.
    Type: Grant
    Filed: February 9, 2004
    Date of Patent: September 7, 2010
    Assignee: Ciba Specialty Chem. Corp.
    Inventors: Hans-Werner Schmidt, Markus Blomenhofer, Klaus Stoll, Hans-Rudolf Meier
  • Patent number: 7790897
    Abstract: The invention describes novel compound of the formula I, wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: September 7, 2010
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch
  • Publication number: 20090227730
    Abstract: The instant invention discloses a process for preventing contact discoloration of substrates coming into contact with elastomers and stabilizing elastomers to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation, which comprises incorporating into the elastomers, or applying to these, at least a compound of the formula (I) wherein R1 is C1-C12alkyl, R2 is C1-C12alkyl, or R1 and R2 together with the carbon atom to which they are attached form an unsubstituted or with C1-C4alkyl substituted C5-C12cycloalkyl ring; R3 is hydrogen or —CH2—S(O)m—R5, R4 and R5 independently of each other are unsubstituted or with cyano substituted C5-C18-alkyl; C7-C9phenylalkyl, unsubstituted or with halogen, hydroxyl, cyano or C1-C4alkyl substituted phenyl or naphthyl; benzothiazolyl or —R6—CO2—R7, R6 is C1-C18alkylene, R7 is C1-C18alkyl, and m is 0, 1 or 2.
    Type: Application
    Filed: October 2, 2006
    Publication date: September 10, 2009
    Applicant: Ciba Corporation
    Inventors: Michèle Gerster, Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi
  • Publication number: 20090144915
    Abstract: The invention describes novel compound of the formula I, wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Application
    Filed: February 5, 2009
    Publication date: June 11, 2009
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch
  • Patent number: 7504510
    Abstract: The invention describes novel compound of the formula (I), wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: March 17, 2009
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch
  • Publication number: 20070149663
    Abstract: A composition containing a) a natural or synthetic polymer and b) one or more compounds of the formula (I), (II) or (III) wherein R1, R2 and R3 or Y1, Y2 and Y3 or Z1, Z2 and Z3 are e.g. branched C3-C20alkyl.
    Type: Application
    Filed: February 9, 2004
    Publication date: June 28, 2007
    Inventors: Hans-Werner Schmidt, Markus Blomenhofer, Klaus Stoll, Hans-Rudolf Meier
  • Patent number: 7217841
    Abstract: Elastomers which have excellent stability to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation comprise, as stabilizers, at least one compound of the formula I [R—S(?O)m—CH2—CH(OH)—CH2]n—N(R1)2-n—R2, ??(I) in which R is C4–C20alkyl, hydroxyl-substituted C4–C20alkyl; phenyl, benzyl, ?-methylbenzyl, ?,?-dimethylbenzyl, cyclohexyl or —(CH2)qCOOR3, and, if m is 0, R may additionally be and, if n is 1 and R4 is hydrogen, R may additionally be R2—R1N—CH2—CH(OH)—CH2—S(?O)m—(CH2)x— or R2—R1N—CH2—CH(OH)—CH2—S(?O)m—CH2—CH2—(O—CH2—CH2)y—, R1 is hydrogen, cyclohexyl or C3–C12alkyl, R2 is R3 is C1-C18alkyl, R4 is hydrogen or —CH2—CH(OH)—CH2—S(?O)m—R, X is C1–C8alkyl, Y is C1–C8alkyl, m is 0 or 1, n is 1 or 2, q is 1 or 2, x is from 2 to 6, and y is 1 or 2. The compounds of the formula I are also suitable as stabilizers for elastomers to prevent contact discoloration of substrates coming into contact with elastomers.
    Type: Grant
    Filed: April 15, 2004
    Date of Patent: May 15, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Samuel Evans
  • Publication number: 20070015870
    Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined in claim 1, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Application
    Filed: September 19, 2006
    Publication date: January 18, 2007
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michele Gerster
  • Patent number: 7160955
    Abstract: Polymers grafted with a compound of formula I, formula (I) wherein the general symbols are as defined in claim 1, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation [R1—SOmnR—SOp—R2.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: January 9, 2007
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster