Abstract: This invention relates to an apparatus for the galvanic deposition of a ml layer on a substrate. The apparatus comprises a container for holding an electrolyte, and an anode container filled with an anode material and having an essentially planar exit surface for the metal ions of the anode material. A substrate holder is connected to a drive shaft that is supported in a drive means mounted on a cover of the container. The cover is pivotable about a pivoting axis of a pivoting means mounted on the side of the container opposite to the anode container. An adjusting plate permits the substrate surface to be adjusted with respect to the exit surface of the anode container facing the substrate surface. The invention provides a more uniform deposition of metal ions on the substrate surface.