Patents by Inventor Rudolf Von Bünau

Rudolf Von Bünau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8416490
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: April 9, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8339701
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: December 25, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Patent number: 8307832
    Abstract: A method for changing a property of an eye uses a continuously multifocal profile that includes a component for increasing a focal depth. The method includes calculating the component for increasing the focal depth to be rotation-symmetrical. Alternatively, or in addition, the calculating is carried out so as to optimize an encircled energy criterion over an extended range of depth.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: November 13, 2012
    Assignee: Carl Zeiss Meditec AG
    Inventors: Eckhard Schroeder, Matthias Wottke, Rudolf von Buenau
  • Publication number: 20120274919
    Abstract: A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y represents height in a direction perpendicular to the optical axis, z represents distance (sag amount) along the optical axis from a tangent plane at a vertex of the reflection surface to a position on the reflection surface at height y, r represents a vertex curvature radius, and R represents a conical coefficient; z=(y2/r)/[1+{1?(1+?)·y2/r2}1/2]??(a), wherein ?1<k<0.
    Type: Application
    Filed: June 25, 2012
    Publication date: November 1, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Publication number: 20120274918
    Abstract: A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.
    Type: Application
    Filed: June 13, 2012
    Publication date: November 1, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Publication number: 20120250147
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: May 14, 2012
    Publication date: October 4, 2012
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8208199
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Grant
    Filed: March 23, 2009
    Date of Patent: June 26, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8208198
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: June 26, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8199400
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Grant
    Filed: September 16, 2009
    Date of Patent: June 12, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Publication number: 20110228217
    Abstract: A method for changing a property of an eye uses a continuously multifocal profile that includes a component for increasing a focal depth. The method includes calculating the component for increasing the focal depth to be rotation-symmetrical. Alternatively, or in addition, the calculating is carried out so as to optimize an encircled energy criterion over an extended range of depth.
    Type: Application
    Filed: May 27, 2011
    Publication date: September 22, 2011
    Applicant: CARL ZEISS MEDITEC AG
    Inventors: Eckhard Schroeder, Matthias Wottke, Rudolf von Buenau
  • Publication number: 20110211252
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax (Y??NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: April 6, 2011
    Publication date: September 1, 2011
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 7950398
    Abstract: A method and device for modifying optical system properties by means of a continuously multifocal profile, wherein said profile comprises a component for increasing the optical system focal depth and is calculated according to a fourth-order Zernike polynom. The aim of said invention is to avoid the eye base refraction and, for this purpose, said focal depth increasing component is also calculated according to the second-order Zernike polynom.
    Type: Grant
    Filed: March 23, 2006
    Date of Patent: May 31, 2011
    Assignee: Carl Zeiss Meditec AG
    Inventors: Eckhard Schroeder, Matthias Wottke, Rudolf von Buenau
  • Patent number: 7869122
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: January 11, 2011
    Assignee: Carl Zeiss SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Publication number: 20100271594
    Abstract: The present invention is directed to a solution for measuring geometric parameters in the eye which are required for calculating the refractive power of intraocular lenses. The device according to the invention for axial length measurement which acquires axial length, anterior corneal radii, anterior chamber depth, and other parameters in the anterior eye segment includes a control unit, a first measuring device for determining axial length, and an additional measuring device which acquires a plurality of structures in the anterior segment (such as the cornea, anterior chamber, and lens) and which has at least one illumination unit and at least one image recording unit. By determining additional partial-distance parameters of the anterior eye segments, the IOL can be calculated with high precision even after refractive surgery in which the natural relationship between the radii of the anterior and posterior corneal surfaces is extensively altered by corneal surgery.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 28, 2010
    Inventors: Roland Bergner, Ingo Koschmieder, Claus Dreher, Rudolf Von Buenau
  • Publication number: 20100265572
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: June 16, 2010
    Publication date: October 21, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Publication number: 20100253999
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.
    Type: Application
    Filed: June 17, 2010
    Publication date: October 7, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Patent number: 7791711
    Abstract: Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an image of a pattern is projected onto a light-sensitive substrate in multiple exposures, in which a first pupil filter function is set on the mirror during a first exposure and, during a subsequent, second exposure, a different, second pupil filter function is set by local changes of geometric reflective properties of the mirror in a locally resolving manner.
    Type: Grant
    Filed: February 25, 2008
    Date of Patent: September 7, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Hubert Holderer, Christian Hembd-Soellner, Rudolf Von Buenau, Ulrich Haag
  • Patent number: 7679821
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: March 16, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Patent number: 7672047
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: March 2, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Publication number: 20100014153
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: September 16, 2009
    Publication date: January 21, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer