Patents by Inventor Rudolf Wolfle

Rudolf Wolfle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the preparation of diffused silicon semiconductor components
    Patent number: 4050966
    Abstract: A method for preparing semiconductor components from silicon as the base material. The components have at least two zones, produced by diffusion, with different conduction type. The diffusion of the individual zones takes place from dopant containing nickel layers applied at the semiconductor crystal surface. The nickel layer including the dopant contained therein, is applied by chemical means.
    Type: Grant
    Filed: June 19, 1975
    Date of Patent: September 27, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Rudolf Wolfle, Dieter Rucker, Uta Lauerer