Abstract: In accordance with a exemplary embodiments, methods for performing reliability testing of a plurality of transistors formed on a substrate includes simultaneously stressing the plurality of transistors by applying a voltage potential from each of a plurality of voltage sources to respective drain contacts of a like plurality of row groups and to gate contacts of a like plurality of column groups for a time interval, while applying a reference potential to the substrate and source contacts of the plurality of transistors. After stressing the plurality of transistors for a time interval, the transistors are each measured individually to collect reliability data.