Patents by Inventor Rudy Pellens

Rudy Pellens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • T-gate formation
    Patent number: 7413942
    Abstract: Methods of forming T-gate structures on a substrate are provided that use only UV-sensitive photoresists. Such methods provide T-gate structures using two lithographic steps using a single wavelength of radiation.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: August 19, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Rudy Pellens, Frank Linskens
  • Lithographic apparatus and method
    Publication number: 20070146679
    Abstract: According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also includes a substrate table for holding the substrate carrier.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Budiman Sutedja, Rudy Pellens, Johannes Paulus Van Den Heuvel, Paulus Leonardus Van Dijk
  • T-gate formation
    Publication number: 20060223245
    Abstract: Methods of forming T-gate structures on a substrate are provided that use only UV-sensitive photoresists. Such methods provide T-gate structures using two lithographic steps using a single wavelength of radiation.
    Type: Application
    Filed: January 28, 2005
    Publication date: October 5, 2006
    Applicants: Rohm and Haas Electronic Materials LLC, ASML Netherlands B.V.
    Inventors: Rudy Pellens, Frank Linskens
  • T-gate formation
    Publication number: 20050202613
    Abstract: Methods of forming T-gate structures on a substrate are provided that use only UV-sensitive photoresists. Such methods provide T-gate structures using two lithographic steps using a single wavelength of radiation.
    Type: Application
    Filed: January 27, 2005
    Publication date: September 15, 2005
    Applicants: Rohm and Haas Electronic Materials LLC, ASML Netherlands B.V.
    Inventors: Rudy Pellens, Frank Linskens
  • Device manufacturing method and substrate
    Publication number: 20050186785
    Abstract: A method of producing a T-gate in a single stage exposure process using electromagnetic radiation is disclosed.
    Type: Application
    Filed: February 23, 2004
    Publication date: August 25, 2005
    Applicant: ASML Netherlands B.V.
    Inventor: Rudy Pellens