Patents by Inventor Rudy Rios

Rudy Rios has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing system
    Publication number: 20030084587
    Abstract: An apparatus for performing contaminant sensitive processing on a substrate. A substrate load chamber receives the substrate from an ambient contaminant laden environment, and isolates the substrate from the ambient contaminant laden environment. The substrate load chamber further forms a first environment of intermediate cleanliness around the substrate. A substrate pass through chamber receives the substrate from the substrate load chamber, and isolates the substrate from the intermediate cleanliness of the first environment of the substrate load chamber. The substrate pass through chamber further forms a second environment of high cleanliness around the substrate. A substrate transfer chamber receives the substrate from the substrate pass through chamber, and isolates the substrate from the high cleanliness of the second environment of the substrate pass through chamber.
    Type: Application
    Filed: December 18, 2002
    Publication date: May 8, 2003
    Applicant: LSI Logic Corporation
    Inventors: Kiran Kumar, Zhihai Wang, Rudy Rios, Wilbur G. Catabay, Richard D. Schinella
  • Substrate processing system
    Patent number: 6518193
    Abstract: An apparatus for performing contaminant sensitive processing on a substrate. A substrate load chamber receives the substrate from an ambient contaminant laden environment, and isolates the substrate from the ambient contaminant laden environment. The substrate load chamber further forms a first environment of intermediate cleanliness around the substrate. A substrate pass through chamber receives the substrate from the substrate load chamber, and isolates the substrate from the intermediate cleanliness of the first environment of the substrate load chamber. The substrate pass through chamber further forms a second environment of high cleanliness around the substrate. A substrate transfer chamber receives the substrate from the substrate pass through chamber, and isolates the substrate from the high cleanliness of the second environment of the substrate pass through chamber.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: February 11, 2003
    Assignee: LSI Logic Corporation
    Inventors: Kiran Kumar, Zhihai Wang, Rudy Rios, Wilbur G. Catabay, Richard D. Schinella