Patents by Inventor Ruediger Duesing

Ruediger Duesing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8279402
    Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: October 2, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stephan Six, Michael Lill, Ruediger Duesing, Bernhard Gellrich, Michael Widmann, Andreas Schubert, Tilmann Von Papen, Thomas Ihl
  • Patent number: 7738187
    Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: June 15, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexandra Pazidis, Stephan Six, Ruediger Duesing, Gennady Fedosenko
  • Publication number: 20090233233
    Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
    Type: Application
    Filed: March 12, 2009
    Publication date: September 17, 2009
    Applicant: Carl Zeiss SMT AG
    Inventors: Stephan SIX, Michael Lill, Ruediger Duesing, Bernhard Gellrich, Michael Widmann, Andreas Schubert, Tilmann Von Papen, Thomas Ihl
  • Publication number: 20080304035
    Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
    Type: Application
    Filed: June 5, 2008
    Publication date: December 11, 2008
    Applicant: Carl Zeiss SMT AG
    Inventors: Alexandra Pazidis, Stephan Six, Ruediger Duesing, Gennady Fedosenko