Patents by Inventor Ruey-Yong Deng

Ruey-Yong Deng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment device and method for aligning apertures in different plates
    Patent number: 8172635
    Abstract: An alignment device for aligning a second aperture in a second plate with a first aperture in a first plate and an alignment method of utilizing the same. The alignment device includes a main body, a first part extending from the main body, and a second part extending from the first part. The main body comprises a first linear dimension exceeding a width of the second aperture for disposing overlying the second plate. The first part comprises a second linear dimension for extending and fitting into the second aperture. The second part comprises a third linear dimension for extending and fitting into the first aperture.
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: May 8, 2012
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jiunn-Nan Lin, Ruey-Yong Deng
  • Implantation quality improvement by xenon/hydrogen dilution gas
    Patent number: 7973293
    Abstract: A method comprises supplying a dopant gas in an arc chamber of an ion source. A dilutant is supplied to dilute the dopant gas. The dilutant comprises about 98.5 wt. % xenon and about 1.5 wt. % hydrogen. An ion beam is generated from the diluted dopant gas using the ion source.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: July 5, 2011
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Peng Lin, Wei-Ming You, Ruey-Yong Deng, Jiunn-Nan Lin, Sheng-Chien Tung, Pin Chia Su
  • IMPLANTATION QUALITY IMPROVEMENT BY XENON/HYDROGEN DILUTION GAS
    Publication number: 20100176306
    Abstract: A method comprises supplying a dopant gas in an arc chamber of an ion source. A dilutant is supplied to dilute the dopant gas. The dilutant comprises about 98.5 wt. % xenon and about 1.5 wt. % hydrogen. An ion beam is generated from the diluted dopant gas using the ion source.
    Type: Application
    Filed: April 1, 2009
    Publication date: July 15, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Peng LIN, Wei-Ming YOU, Ruey-Yong DENG, Jiunn-Nan LIN, Sheng-Chien TUNG, Pin Chia SU
  • Alignment device and method for aligning apertures in different plates
    Publication number: 20070161320
    Abstract: An alignment device for aligning a second aperture in a second plate with a first aperture in a first plate and an alignment method of utilizing the same. The alignment device includes a main body, a first part extending from the main body, and a second part extending from the first part. The main body comprises a first linear dimension exceeding a width of the second aperture for disposing overlying the second plate. The first part comprises a second linear dimension for extending and fitting into the second aperture. The second part comprises a third linear dimension for extending and fitting into the first aperture.
    Type: Application
    Filed: January 12, 2006
    Publication date: July 12, 2007
    Inventors: Jiunn-Nan Lin, Ruey-Yong Deng