Abstract: Provided are a battery cell, a battery, an electrical device, and a manufacturing method and device for a battery cell, which belong to the field of battery technologies. The battery cell includes a case, an electrode assembly, an end cover, and a current collecting member. The case has an opening. The electrode assembly is accommodated in the case. The end cover covers the opening and is sealed and connected to the case. The current collecting member is accommodated in the case and located at a side of the electrode assembly facing the end cover. The current collecting member is configured to connect the case and the electrode assembly to electrically connect the electrode assembly to the case. The battery cell with such structure realizes an electrical connection between the electrode assembly and the case through the current collecting member. During assembling of the battery cell.

Abstract: A displaying base plate and a manufacturing method thereof, and a displaying device. The displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate, wherein the second electrode layer is disposed closer to the substrate, the second electrode layer is connected to the first electrode pattern and the third electrode layer.

Abstract: A system and method for cleaning an optical element of an EUV optical system is disclosed. The system and method may include receiving design data of one or more samples. The system and method may include simulating a plurality of irradiance distributions at a plane of an EUV optical sub-system based on the design data and one or more parameters. The system and method may include aggregating the plurality of irradiance distributions to generate an aggregated irradiance distribution. The system and method may include determining a predicted contaminate distribution based on both the aggregated irradiance distribution and a contaminate growth rate. The system and method may include determining a cleaning recipe for the one or more optical elements based on the predicted contaminate distribution.

Abstract: An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.

Abstract: A heat dissipation assembly and an electric energy conversion apparatus are disclosed according to the present application. The heat dissipation assembly comprises a side cover connected to the electric energy conversion apparatus and an air outlet cover, a heat dissipation passage is formed by enclosure of the side cover and one side surface of the electric energy conversion apparatus, the side cover is provided with an air inlet in communication with the heat dissipation passage; the air outlet cover is arranged at the top of the electric energy conversion apparatus and partially connected with the side cover, and an air outlet space is formed by enclosure of the air outlet cover, the air outlet space is in communication with the heat dissipation passage, the air outlet cover is provided with an air outlet at an outer peripheral side of the air outlet cover away from the electric energy conversion apparatus.

Abstract: A photomask includes a plurality of distinctly patterned regions to provide different respective intensities of extreme ultraviolet (EUV) light in response to illumination with an EUV beam. The photomask may be part of a system that also includes a time-delay-integration (TDI) inspection tool with an EUV light source and a TDI sensor. The EUV light source is to generate the EUV beam. The photomask is to be loaded into the TDI inspection tool. The system further includes a reference intensity detector to be mounted in the TDI inspection tool to measure intensities of EUV light collected from the photomask.

Abstract: To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.

Abstract: Embodiments of this application disclose a fault detection method, and relate to the field of computer technologies. The method according to embodiments of this application includes: obtaining a scheduling table of a target task, where the scheduling table is used to indicate at least one test pattern, the at least one test pattern is used to detect a fault in a target logic circuit, and the target logic circuit is a logic circuit configured to execute the target task; and executing the at least one test pattern based on the scheduling table, to detect the fault in the target logic circuit. By determining the scheduling table of the target task, the test pattern included in the scheduling table is executed, so that execution of all test patterns in a software test library can be avoided. This reduces load of a processor, and effectively improves working efficiency of the processor.

Abstract: A cover plate of a box body for a server includes a main body, a folding edge, and a buckle. The folding edge is vertically connected to the main body, the buckle is disposed on the folding edge, and the buckle can extend along one side of the folding edge and face the main body. The present disclosure also provides a box body and a box body manufacturing method.

Abstract: An acousto-optic modulator (AOM) laser frequency shifter system includes a laser configured to generate an incident beam, a first optical splitter optically coupled to the laser and configured to split the incident beam into at least one portion of the incident beam, at least one phase-shift channel optically coupled to the first optical splitter and configured to generate at least one frequency-shifted beam with an acousto-optic modulator (AOM) from the at least one portion of the incident beam received from the first optical splitter, and a second optical splitter configured to receive the at least one frequency-shifted beam from the at least one phase-shift channel and configured to direct the at least one frequency-shifted beam to an interferometer configured to acquire an interferogram of a sample with the at least one frequency-shifted beam.

Abstract: Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To produce the focal map, the measured heights of the patterned areas are adjusted based on fill factors for the patterned areas. The photomask is inspected for defects, using the focal map.

Abstract: The present teaching relates to method, system, medium, and implementations for enabling communication with a user. Information representing surrounding of a user to be engaged in a new dialogue is received via the communication platform, wherein the information is acquired from a scene in which the user is present and captures characteristics of the user and the scene. Relevant features are extracted from the information. A state of the user is estimated based on the relevant features, and a dialogue context surrounding the scene is determined based on the relevant features. A topic for the new dialogue is determined based on the user, and a feedback is generated to initiate the new dialogue with the user based on the topic, the state of the user, and the dialogue context.

Abstract: An optical system with aberration correction is disclosed. The optical system may include an illumination source. The optical system may include a detector. The optical system may include one or more collection optics configured to image a sample onto the detector based on illumination from the illumination source. The optical system may include two or more aberration correction plates located in one or more pupil planes of the one or more collection optics. The two or more aberration correction plates may provide at least partial correction of two or more linearly-independent aberration terms. Any particular one of the two or more aberration correction plates may have a spatially-varying thickness profile providing a selected amount of correction for a single particular aberration term of the two or more linearly-independent aberration terms.

Abstract: The invention provides a processing circuit with multiple power supply ports and an electronic device. The processing circuit includes: N power supply ports; a first-level power supply; N middle transmission modules, connected between the first-level power supply and the corresponding power supply port, wherein at least one of which is used as a second-level power supply; and a charging protocol control module. The charging protocol control module is respectively connected to the first-level power supply, the N power supply ports, and the N middle transmission modules. The second-level power supply operates in a switching power mode or a pass through mode. In the pass through mode, the output voltage of the second-level power supply matches the input voltage received by the first-level power supply, and the output voltage of the second-level power supply is not adjustable.

Abstract: The utility model is realized through the following technical scheme: an energy saving dynamic effluent sprinkler, comprises a shell, a water inlet seat, a water outlet device and a water outlet cover, the water outlet device is arranged in the shell, the water outlet cover is connected with the shell, and the water outlet cover is provided with a water outlet hole; Among them, the water outlet device comprises a base, an inclined water body, a swing water component, an impeller component and a driving component, the inclined water body is connected with the base to form a cavity, the cavity has a water outlet, the impeller component is arranged in the cavity, driven by the impeller component, the driving component can drive the swing water component to swing back and forth; The swing water component is mounted on the base and can swing in the base, the swing component is provided with a water passing chamber, the side surface of the swing component is provided with a water passing outlet, he water outlet is

Abstract: A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.

Abstract: Reference and test waves are directed in a common path mode in a fiber tip diffraction interferometer. A first fiber can be used to generate the reference wave and a second fiber can be used to generate the test wave. Each fiber can include a single mode fiber tip that defines a wedge at an end without a coating on end surface or a tapered fiber tip. The fiber tip diffraction interferometer can include an aplanatic pupil imaging lens or system disposed to receive both the test wave and the reference wave and a sensor configured to receive both the test wave and the reference wave.

Abstract: The invention provides a processing circuit with multiple power supply ports and an electronic device. The processing circuit includes: N power supply ports; a first-level power supply; N middle transmission modules, connected between the first-level power supply and the corresponding power supply port, wherein at least one of which is used as a second-level power supply; and a charging protocol control module. The charging protocol control module is respectively connected to the first-level power supply, the N power supply ports, and the N middle transmission modules. The second-level power supply operates in a switching power mode or a pass through mode. In the pass through mode, the output voltage of the second-level power supply matches the input voltage received by the first-level power supply, and the output voltage of the second-level power supply is not adjustable.

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A plurality of reference far field images are simulated by inputting a plurality of reference near field images into a physics-based model, and the plurality of reference near field images are generated by a trained deep learning model from a test portion of the design database that was used to fabricate a test area of a test reticle. The test area of a test reticle, which was fabricated from the design database, is inspected for defects via a die-to-database process that includes comparing the plurality of reference far field reticle images simulated by the physic-based model to a plurality of test images acquired by the inspection system from the test area of the test reticle.

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A near field reticle image is generated via a deep learning process based on a reticle database image produced from a design database, and a far field reticle image is simulated at an image plane of an inspection system via a physics-based process based on the near field reticle image. The deep learning process includes training a deep learning model based on minimizing differences between the far field reticle images and a plurality of corresponding training reticle images acquired by imaging a training reticle fabricated from the design database, and such training reticle images are selected for pattern variety and are defect-free.