Patents by Inventor Rui-Ming Lai

Rui-Ming Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9448487
    Abstract: A method of manufacturing semiconductor and an exposure system are provided. The method includes the following step. A material layer is formed on a substrate. A patterned photoresist layer is formed a on the material layer and a monitor parameter group is produced from a state information of the patterned photoresist layer. The monitor parameter group is calculated based on a mathematic formula to obtain a virtual parameter. Whether the virtual parameter is less than a reference value is determined. A layout process is performed on the material layer when the virtual parameter is less than the reference value.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: September 20, 2016
    Assignee: MACRONIX International Co., Ltd.
    Inventors: Shih-Rung Wu, Rui-Ming Lai
  • Publication number: 20150287622
    Abstract: A method of manufacturing semiconductor and an exposure system are provided. The method includes the following step. A material layer is formed on a substrate. A patterned photoresist layer is formed a on the material layer and a monitor parameter group is produced from a state information of the patterned photoresist layer. The monitor parameter group is calculated based on a mathematic formula to obtain a virtual parameter. Whether the virtual parameter is less than a reference value is determined. A layout process is performed on the material layer when the virtual parameter is less than the reference value.
    Type: Application
    Filed: May 30, 2014
    Publication date: October 8, 2015
    Applicant: MACRONIX International Co., Ltd.
    Inventors: Shih-Rung Wu, Rui-Ming Lai