Abstract: An interband cascade (IC) optoelectronic device constructed to have a plurality of IC stages, wherein each of the IC stages comprises: a hole injector; an electron injector; an active region coupled to the hole injector and the electron injector and comprising a first layer, wherein the first layer comprises a first material, and wherein the first material comprises InAsP or AlInAsP; a conduction band running through the hole injector, the electron injector, and the active region; and a valence band running through the hole injector, the electron injector, and the active region. In certain embodiments, the IC optoelectronic device may be a laser (ICL), a light-emitting diode (LED), a superluminescent light-emitting diode (SLED), a photodector, or a photovoltaic device.

Abstract: An ICL comprises: a plurality of IC stages, wherein each of the IC stages comprises: a hole injector; an electron injector; an active region coupled to the hole injector and the electron injector and comprising a first layer, wherein the first layer comprises a first material, and wherein the first material comprises InAsP or AlInAsP; a conduction band running through the hole injector, the electron injector, and the active region; and a valence band running through the hole injector, the electron injector, and the active region.

Abstract: An ICIP comprises: a number Ns of IC stages, wherein Ns is configured to achieve a fundamental limit of the detectivity Dpeak* the ICIP within a range, and wherein each of the IC stages comprises: a hole barrier; an absorber coupled to the hole barrier and comprising a thickness d, wherein d is configured to achieve Dpeak* within the range; and an electron barrier coupled to the absorber. A method of manufacturing an ICIP comprises: determining a number Ns of IC stages of the ICIP, wherein Ns is configured to achieve a peak detectivity Dpeak* of the ICIP within a range; determining a thickness d of an absorber, wherein d is configured to achieve Dpeak* within the range; obtaining a substrate; forming an electron barrier on the substrate, the absorber having d on the electron barrier, and a hole barrier on the absorber; and repeating the forming Ns times.

Abstract: A PV device comprises a first mirror comprising a reflectance of higher than 50%; a second mirror interface; and an optical cavity positioned between the first mirror and the second mirror interface and comprising at least one IC stage. Each of the at least one IC stage comprises a conduction band; a valence band; a hole barrier comprising a first band gap; an absorption region coupled to the hole barrier, comprising a second band gap that is less than the first band gap, and configured to absorb photons; and an electron barrier coupled to the absorption region so that the absorption region is positioned between the hole barrier and the electron barrier. The electron barrier comprises a third band gap that is greater than the second band gap. The PV device is configured to operate at a forward bias voltage with a net photon absorption for generating an electric output.

Abstract: A PV device comprises a first mirror comprising a reflectance of higher than 50%; a second mirror interface; and an optical cavity positioned between the first mirror and the second mirror interface and comprising at least one IC stage. Each of the at least one IC stage comprises a conduction band; a valence band; a hole barrier comprising a first band gap; an absorption region coupled to the hole barrier, comprising a second band gap that is less than the first band gap, and configured to absorb photons; and an electron barrier coupled to the absorption region so that the absorption region is positioned between the hole barrier and the electron barrier. The electron barrier comprises a third band gap that is greater than the second band gap. The PV device is configured to operate at a forward bias voltage with a net photon absorption for generating an electric output.

Abstract: Photovoltaic (PV) and photodetector (PD) devices, comprising a plurality of interband cascade (IC) stages, wherein the IC stages comprise an absorption region with a type-I superlattice and/or a bulk semiconductor material having a band gap, the absorption region configured to absorb photons, an intraband transport region configured to act as a hole barrier, and an interband tunneling region configured to act as an electron barrier, wherein the absorption region, the intraband transport region, and the interband tunneling region are positioned such that electrons will flow from the absorption region to the intraband transport region to the interband tunneling region.

Abstract: An interband cascade (IC) light emitting device comprising a plurality of interband cascade stages, wherein at least one of the IC stages is constructed to have an electron injector made of one or more QWs, a type-I quantum well (QW) active region, a barrier layer positioned between the active region and the electron injector, a hole injector made of one or more QWs, and a barrier layer positioned between the active region and the hole injector. In at least one embodiment, a type II heterointerface layer is between the electron injector and an adjacent hole injector. The well layer of the type-I QW active region has compressive strain, while the barrier layers which flank the type-I QW active region comprise tensile strain layers. In certain embodiments, the electron injector and the hole injector comprise tensile strained layers.

Abstract: An interband cascade (IC) light emitting device comprising a plurality of interband cascade stages, wherein at least one of the IC stages is constructed to have an electron injector made of one or more QWs, a type-I quantum well (QW) active region, a barrier layer positioned between the active region and the electron injector, a hole injector made of one or more QWs, and a barrier layer positioned between the active region and the hole injector. In at least one embodiment, a type II heterointerface layer is between the electron injector and an adjacent hole injector. The well layer of the type-I QW active region has compressive strain, while the barrier layers which flank the type-I QW active region comprise tensile strain layers. In certain embodiments, the electron injector and the hole injector comprise tensile strained layers.

Abstract: A semiconductor interband cascade laser having an outer cladding layer formed from a material selected from the group consisting of a high-doped semiconductor material, a dielectric material and/or a metal, having an outer cladding layer refractive index and/or permittivity; an intermediate cladding layer formed from a semiconductor material having an intermediate cladding layer refractive index and/or permittivity which is greater than the outer cladding layer refractive index and/or permittivity; and a waveguide core having an active region having an active region refractive index and/or permittivity, the active region configured to generate light based on interband transitions, the light defining a lasing wavelength, wherein the intermediate cladding layer is positioned between the outer cladding layer and the waveguide core; and wherein the active region refractive index and/or permittivity is greater than the intermediate cladding layer refractive index and/or permittivity.

Abstract: A tunable semiconductor laser having, in one embodiment, a higher bias voltage end, a lower bias voltage end, and an optically active gain region comprising a band-gap configured to emit light at an emission wavelength that is tunable when an electric field is generated across the optically active gain region by applying a bias voltage thereto, an electron quantum well (QW) layer positioned closer to the higher bias voltage end than the lower voltage bias end, and a hole QW layer positioned closer to the lower bias voltage end than the higher bias voltage end and comprising a type-II band alignment with the electron QW layer such that the band-gap is determined by an energy difference between a ground electron state in the electron QW layer and a ground hole state in the hole QW layer, wherein the emission wavelength is redshifted upon an increase in a bias voltage applied to the optically active gain region.

Abstract: A semiconductor interband laser that includes a first cladding layer formed using a first high-doped semiconductor material having a first refractive index/permittivity and a second cladding layer formed using a second high-doped semiconductor material having a second refractive index/permittivity. The laser also includes a waveguide core having a waveguide core refractive index/permittivity, the waveguide core is positioned between the first and the second cladding layers. The waveguide core including an active region adapted to generate light based on interband transitions. The light being generated defines the lasing wavelength or the lasing frequency. The first refractive index and the second refractive index are lower than the waveguide core refractive index. The first cladding layer and/or the second cladding layers can also be formed using a metal.

Abstract: A semiconductor interband laser that includes a first cladding layer formed using a first high-doped semiconductor material having a first refractive index/permittivity and a second cladding layer formed using a second high-doped semiconductor material having a second refractive index/permittivity. The laser also includes a waveguide core having a waveguide core refractive index/permittivity, the waveguide core is positioned between the first and the second cladding layers. The waveguide core including an active region adapted to generate light based on interband transitions. The light being generated defines the lasing wavelength or the lasing frequency. The first refractive index and the second refractive index are lower than the waveguide core refractive index. The first cladding layer and/or the second cladding layers can also be formed using a metal.

Abstract: Photovoltaic (PV) and photodetector (PD) devices, comprising a plurality of interband cascade (IC) stages, wherein the IC stages comprise an absorption region with a type-I superlattice and/or a bulk semiconductor material having a band gap, the absorption region configured to absorb photons, an intraband transport region configured to act as a hole barrier, and an interband tunneling region configured to act as an electron barrier, wherein the absorption region, the intraband transport region, and the interband tunneling region are positioned such that electrons will flow from the absorption region to the intraband transport region to the interband tunneling region.

Abstract: A photovoltaic (PV) device, comprising a PV interband cascade (IC) stage, wherein the IC PV stage comprises an absorption region with a band gap, the absorption region configured to absorb photons, an intraband transport region configured to act as a hole barrier, and an interband tunneling region configured to act as an electron barrier. An IC PV architecture for a photovoltaic device, the IC PV architecture comprising an absorption region, an intraband transport region coupled to the absorption region, and an interband tunneling region coupled to the intraband transport region and to the adjacent absorption region, wherein the absorption region, the intraband transport region, and the interband tunneling region are positioned such that electrons will flow from the absorption region to the intraband transport region to the interband tunneling region.

Abstract: A tunable semiconductor laser having, in one embodiment, a higher bias voltage end, a lower bias voltage end, and an optically active gain region comprising a band-gap configured to emit light at an emission wavelength that is tunable when an electric field is generated across the optically active gain region by applying a bias voltage thereto, an electron quantum well (QW) layer positioned closer to the higher bias voltage end than the lower voltage bias end, and a hole QW layer positioned closer to the lower bias voltage end than the higher bias voltage end and comprising a type-II band alignment with the electron QW layer such that the band-gap is determined by an energy difference between a ground electron state in the electron QW layer and a ground hole state in the hole QW layer, wherein the emission wavelength is redshifted upon an increase in a bias voltage applied to the optically active gain region.

Abstract: A semiconductor interband laser that includes a first cladding layer formed using a first high-doped semiconductor material having a first refractive index/permittivity and a second cladding layer formed using a second high-doped semiconductor material having a second refractive index/permittivity. The laser also includes a waveguide core having a waveguide core refractive index/permittivity, the waveguide core is positioned between the first and the second cladding layers. The waveguide core including an active region adapted to generate light based on interband transitions. The light being generated defines the lasing wavelength or the lasing frequency. The first refractive index and the second refractive index are lower than the waveguide core refractive index. The first cladding layer and/or the second cladding layers can also be formed using a metal.

Abstract: A photovoltaic (PV) device, comprising a PV interband cascade (IC) stage, wherein the IC PV stage comprises an absorption region with a band gap, the absorption region configured to absorb photons, an intraband transport region configured to act as a hole barrier, and an interband tunneling region configured to act as an electron barrier. An IC PV architecture for a photovoltaic device, the IC PV architecture comprising an absorption region, an intraband transport region coupled to the absorption region, and an interband tunneling region coupled to the intraband transport region and to the adjacent absorption region, wherein the absorption region, the intraband transport region, and the interband tunneling region are positioned such that electrons will flow from the absorption region to the intraband transport region to the interband tunneling region.

Abstract: A semiconductor interband laser that includes a first cladding layer formed using a first high-doped semiconductor material having a first refractive index/permittivity and a second cladding layer formed using a second high-doped semiconductor material having a second refractive index/permittivity. The laser also includes a waveguide core having a waveguide core refractive index/permittivity, the waveguide core is positioned between the first and the second cladding layers. The waveguide core including an active region adapted to generate light based on interband transitions. The light being generated defines the lasing wavelength or the lasing frequency. The first refractive index and the second refractive index are lower than the waveguide core refractive index. The first cladding layer and/or the second cladding layers can also be formed using a metal.

Abstract: A device for detecting radiation, typically in the infrared. Photons are absorbed in an active region of a semiconductor device such that the absorption induces an interband electronic transition and generates photo-excited charge carriers. The charge carriers are coupled into a carrier transport region having multiple quantum wells and characterized by intersubband relaxation that provides rapid charge carrier collection. The photo-excited carriers are collected from the carrier transport region at a conducting contact region. Another carrier transport region characterized by interband tunneling for multiple stages draws charge carriers from another conducting contact and replenishes the charge carriers to the active region for photo-excitation. A photocurrent is generated between the conducting contacts through the active region of the device.

Abstract: The present invention relates to quantum well semiconductor light emitting devices such as lasers and other devices that utilize type-II quantum wells and interband transitions of energy states between the conduction band and the valence band for light emission, resulting in significant improvement in radiative efficiency. The semiconductor light emitting devices comprise a multilayer semiconductor structure comprising a plurality of essentially identical active regions, each active region being separated from its adjoining active regions by an injection region that serves as the collector for the preceding active region and the emitter for the following active region. Each of said active regions comprises multiple quantum well regions or finite superlattice regions to improve carrier injection efficiency and enhance optical gain without using a large number of cascade stages. This can reduce the operating voltage and increase the power efficiency.