Abstract: A first opening is formed in a first metal layer by etching away part of the first metal layer, and a second metal layer is filled in the first opening and is electrically connected to the remainder of the first metal layer. A TSV extends sequentially through a substrate and a partial thickness of a dielectric layer so that the second metal layer is exposed therein, and an interconnect layer in the TSV is electrically connected to the second metal layer. Therefore, the first metal layer can be picked up as long as projections of the second metal layer and the interconnect layer are encompassed within a projection of the first metal layer on the substrate, without any additional lateral area of the first metal layer being occupied by the TSV. The second metal layer that leads out the first metal layer can be formed by only one photolithography process.

Abstract: Disclosed is a method for preparing a carbonized silk photocatalyst, comprising; soaking a natural silk and an activator in water, taking out the soaked silk, and drying the same; and roasting the dried silk under the protection of an inert atmosphere to prepare a carbonized silk photocatalyst. Also disclosed is a method for photocatalytic desulfurization of a fuel oil, comprising: mixing a fuel oil to be desulfurated, an extraction agent and a carbonized silk photocatalyst, with air being used as an oxidizing agent, to conduct a photocatalytic reaction under light irradiation, and separating an upper oil phase to obtain a desulfurated fuel oil. The catalyst has a simple preparation process, and can effectively reduce dibenzothiophene sulfides, which are difficult to remove, in the fuel oil under UV light radiation. Desulfurization can be achieved at room temperature, and reaction conditions are mild.