Patents by Inventor Rujun Bai

Rujun Bai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
    Publication number: 20240234091
    Abstract: Methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate include pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
    Type: Application
    Filed: October 24, 2023
    Publication date: July 11, 2024
    Inventors: Matthew Scott Weimer, Pramod Subramonium, Ragesh Puthenkovilakam, Rujun Bai, David French
  • DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
    Publication number: 20240136153
    Abstract: Methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate include pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
    Type: Application
    Filed: October 23, 2023
    Publication date: April 25, 2024
    Inventors: Matthew Scott Weimer, Pramod Subramonium, Ragesh Puthenkovilakam, Rujun Bai, David French
  • Depositing a carbon hardmask by high power pulsed low frequency RF
    Patent number: 11837441
    Abstract: Methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate include pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: December 5, 2023
    Assignee: Lam Research Corporation
    Inventors: Matthew Scott Weimer, Pramod Subramonium, Ragesh Puthenkovilakam, Rujun Bai, David French
  • CYANO-SUBSTITUTED CYCLIC HYDRAZINE DERIVATIVE AND APPLICATION THEREOF
    Publication number: 20220339146
    Abstract: The present invention provides a cyano-substituted cyclic hydrazine derivative, comprising: a compound represented by the following structural formula or a stereoisomer, a geometric isomer, a tautomer, a racemate, a hydrate, a solvate, a metabolite and a pharmaceutically acceptable salt or a prodrug thereof. The compound is used for prevention, treatment or alleviation of autoimmune diseases or proliferative diseases in patients, and/or for inhibiting or modulating protein kinase activity.
    Type: Application
    Filed: June 11, 2020
    Publication date: October 27, 2022
    Applicant: E-nitiate Biopharmaceuticals (Hangzhou) Co., Ltd
    Inventors: Wang SHEN, Pengfei LIU, Rujun BAI, Yufei LIU, Qiuping LUO, Pingbo KE, Yanchuan GONG
  • HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN DIAMOND-LIKE CARBON HARDMASKS BY HIGH POWER PULSED LOW FREQUENCY RF
    Publication number: 20220216037
    Abstract: Provided herein are methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate by pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
    Type: Application
    Filed: May 28, 2020
    Publication date: July 7, 2022
    Applicant: Lam Research Corporation
    Inventors: Matthew Scott Weimer, Pramod Subramonium, Ragesh Puthenkovilakam, Rujun Bai, David French