Patents by Inventor Runfa PAN
Runfa PAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11539897Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: GrantFiled: February 5, 2021Date of Patent: December 27, 2022Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
-
Patent number: 11194227Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.Type: GrantFiled: July 20, 2020Date of Patent: December 7, 2021Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Runfa Pan, Quan Chen, Guangyue Shen, Yanfen Zhou, Lu Kuang
-
Publication number: 20210160417Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: ApplicationFiled: February 5, 2021Publication date: May 27, 2021Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI
-
Patent number: 10924684Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: GrantFiled: April 26, 2019Date of Patent: February 16, 2021Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
-
Publication number: 20200348580Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.Type: ApplicationFiled: July 20, 2020Publication date: November 5, 2020Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Runfa PAN, Quan CHEN, Guangyue SHEN, Yanfen ZHOU, Lu KUANG
-
Patent number: 10721409Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.Type: GrantFiled: June 27, 2019Date of Patent: July 21, 2020Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Yanfen Zhou, Runfa Pan, Liangcheng Li, Qianfeng Huang, Erli Lu, Mingzhu Chen
-
Publication number: 20190320107Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.Type: ApplicationFiled: June 27, 2019Publication date: October 17, 2019Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Yanfen ZHOU, Runfa PAN, Liangcheng LI, Qianfeng HUANG, Erli LU, Mingzhu CHEN
-
Publication number: 20190253601Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained, The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: ApplicationFiled: April 26, 2019Publication date: August 15, 2019Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI