Patents by Inventor Runfa PAN

Runfa PAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11539897
    Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: December 27, 2022
    Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
  • Patent number: 11194227
    Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: December 7, 2021
    Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Runfa Pan, Quan Chen, Guangyue Shen, Yanfen Zhou, Lu Kuang
  • Publication number: 20210160417
    Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
    Type: Application
    Filed: February 5, 2021
    Publication date: May 27, 2021
    Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI
  • Patent number: 10924684
    Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: February 16, 2021
    Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
  • Publication number: 20200348580
    Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.
    Type: Application
    Filed: July 20, 2020
    Publication date: November 5, 2020
    Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Runfa PAN, Quan CHEN, Guangyue SHEN, Yanfen ZHOU, Lu KUANG
  • Patent number: 10721409
    Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: July 21, 2020
    Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Yanfen Zhou, Runfa Pan, Liangcheng Li, Qianfeng Huang, Erli Lu, Mingzhu Chen
  • Publication number: 20190320107
    Abstract: The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 17, 2019
    Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Yanfen ZHOU, Runfa PAN, Liangcheng LI, Qianfeng HUANG, Erli LU, Mingzhu CHEN
  • Publication number: 20190253601
    Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained, The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
    Type: Application
    Filed: April 26, 2019
    Publication date: August 15, 2019
    Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
    Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI