Patents by Inventor Ruoxi SHEN

Ruoxi SHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming intermetallic air gap
    Patent number: 12002708
    Abstract: The present invention discloses a method for forming an intermetallic air gap, which comprises following steps: S01: forming a trench in a solid dielectric; S02: preparing an insulating sheet-like two-dimensional material, wherein the insulating sheet-like two-dimensional material comprises an insulating nano sheet-like layer, the size of the insulating nano sheet-like layer in the sheet-like two-dimensional direction is greater than the size of the trench; S03: the insulating sheet-like two-dimensional material is deposited on the solid dielectric and the trench; S04: annealing the solid dielectric and the insulating sheet-like two-dimensional material to form a stable thin film composed of insulating sheet-like two-dimensional material on the trench.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: June 4, 2024
    Assignees: SHANGHAI IC R&D CENTER CO., LTD., SHANGHAI INTEGRATED CIRCUIT EQUIPMENT & MATERIALS INDUSTRY INNOVATION CENTER CO., LTD
    Inventors: Xiaoxu Kang, Ruoxi Shen, Xiaolan Zhong
  • METHOD FOR FORMING INTERMETALLIC AIR GAP
    Publication number: 20220246466
    Abstract: The present invention discloses a method for forming an intermetallic air gap, which comprises following steps: S01: forming a trench in a solid dielectric; S02: preparing an insulating sheet-like two-dimensional material, wherein the insulating sheet-like two-dimensional material comprises an insulating nano sheet-like layer, the size of the insulating nano sheet-like layer in the sheet-like two-dimensional direction is greater than the size of the trench; S03: the insulating sheet-like two-dimensional material is deposited on the solid dielectric and the trench; S04: annealing the solid dielectric and the insulating sheet-like two-dimensional material to form a stable thin film composed of insulating sheet-like two-dimensional material on the trench.
    Type: Application
    Filed: December 4, 2019
    Publication date: August 4, 2022
    Inventors: XIAOXU KANG, Ruoxi SHEN, Xiaolan ZHONG