Patents by Inventor Ruoyao LI

Ruoyao LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11721947
    Abstract: An optical compensation system for a laser beam and an excimer laser annealing device are provided in the present disclosure. The optical compensation system for the laser beam includes a laser source, a beam splitter and a reversion assembly. The laser beam emitted by the laser source enters the beam splitter, and is divided by the beam splitter into a first light beam and a second light beam having different transmission paths. The second light beam is reversed and reflected by the reversion assembly, enters the beam splitter, and exits from the beam splitter together with the first light beam. An asymmetry of the second light beam reversed by the reversion assembly is different from an asymmetry of the first light beam.
    Type: Grant
    Filed: September 28, 2021
    Date of Patent: August 8, 2023
    Assignees: Chongqing BOE Display Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Sangho Jeon, Junsung Kang, Zhaoli Lu, Songlin Liu, Ruoyao Li, Hailan Piao
  • Publication number: 20220102934
    Abstract: An optical compensation system for a laser beam and an excimer laser annealing device are provided in the present disclosure. The optical compensation system for the laser beam includes a laser source, a beam splitter and a reversion assembly. The laser beam emitted by the laser source enters the beam splitter, and is divided by the beam splitter into a first light beam and a second light beam having different transmission paths. The second light beam is reversed and reflected by the reversion assembly, enters the beam splitter, and exits from the beam splitter together with the first light beam. An asymmetry of the second light beam reversed by the reversion assembly is different from an asymmetry of the first light beam.
    Type: Application
    Filed: September 28, 2021
    Publication date: March 31, 2022
    Inventors: Sangho JEON, Junsung KANG, Zhaoli LU, Songlin LIU, Ruoyao LI, Hailan PIAO