Abstract: An apparatus providing a source of shortwave electromagnetic radiation utilizing a tape having a first side and a second side and a laser beam focused and impinging on the first side of the tape. The apparatus utilizes a tape storage unit which delivers or feeds tape from the same. A base supports a first projecting element which contacts the second side of the tape emanating from the storage unit. A second projecting element supported by the base contacts the first side of the tape being fed from the tape storage unit. The portion of the tape between the first and second projecting elements constantly lies in a plane during the feeding of the tape and provides a target surface for a focused laser beam which generates shortwave radiation.

Abstract: A reflectometer device for determining the quality characteristics of an electronic chip mask blank utilizing a source of electromagnetic radiation in the extreme ultraviolet region. The source is passed to a monochrometer which includes a mirror, a rotatable grating, and an exit slit. The radiation travels to the mirror and is reflected to the grating which, in turn, provides a source of electromagnetic radiation which is essentially continuous and of a particular bandwidth. The grating is rotated to tune such source of electromagnetic radiation which is passed to the subject blank mask. Upon reflection from the mask, a detector determines the intensity of the reflected beam from the mask and translates such measurement into a determination of reflectivity.

Abstract: A system for inspecting lithography masks utilizing a laser source to produce a coherent electromagnetic radiation pulse. The pulse is passed to a target which creates a plasma resulting in an extreme ultraviolet (EUV) beam. The beam is condensed and passed through an aperture to define a cross-sectional area of the condensed EUV beam on a lithography mask. A transmission zone plate resolves the image reflected from the lithography mask and passes the image to a detector for analysis.