Patents by Inventor Ruriko Tsuneta
Ruriko Tsuneta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9830524Abstract: In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).Type: GrantFiled: May 24, 2012Date of Patent: November 28, 2017Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Tomoko Sekiguchi, Takeyoshi Ohashi, Junichi Tanaka, Zhaohui Cheng, Ruriko Tsuneta, Hiroki Kawada, Seiko Hitomi
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Patent number: 8993961Abstract: The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate.Type: GrantFiled: January 21, 2011Date of Patent: March 31, 2015Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hideki Kikuchi
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Patent number: 8963102Abstract: An apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: GrantFiled: January 11, 2013Date of Patent: February 24, 2015Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Publication number: 20150036914Abstract: In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).Type: ApplicationFiled: May 24, 2012Publication date: February 5, 2015Inventors: Tomoko Sekiguchi, Takeyoshi Ohashi, Junichi Tanaka, Zhaohui Cheng, Ruriko Tsuneta, Hiroki Kawada, Seiko Hitomi
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Publication number: 20140353500Abstract: There is provided an apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: ApplicationFiled: January 11, 2013Publication date: December 4, 2014Inventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Patent number: 8442300Abstract: A specified position in an array structure in which a reference pattern is displayed repetitively through reference pattern counting is identified. In an array structure image, the pattern detection estimating area generated from a starting point, the address of the starting point, and a unit vector are compared with a pattern detected position found in pattern matching with the reference pattern image, to execute pattern counting while determining correct detection, oversights, wrong detection, etc. Array structure images are photographed sequentially while moving the visual field with the use of an image shifting deflector to continue the pattern counting started at the starting point to identify the ending point specified with an address. If the ending point is not reached only with use of the image shifting deflector, the visual field moving range of the image shifting deflector is moved with use of a specimen stage.Type: GrantFiled: February 8, 2007Date of Patent: May 14, 2013Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Tohru Ando, Junzo Azuma
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Patent number: 8334519Abstract: In a specimen analyzing apparatus such as a transmission electron microscope for analyzing the structure, composition and electron state of an observing specimen in operation by applying external voltage to the specimen to be observed, a specimen support (mesh) including a mesh electrode connectable to external voltage applying portions of the specimen and a specimen holder including a specimen holder electrode connectable to the mesh electrode and current inlet terminals as well are provided. Voltage is applied externally of the specimen analyzing apparatus to the external voltage applying portions of the specimen through the medium of the specimen holder electrode and mesh electrode.Type: GrantFiled: May 8, 2007Date of Patent: December 18, 2012Assignee: Hitachi, Ltd.Inventors: Shiano Ono, Masanari Koguchi, Ruriko Tsuneta
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Publication number: 20120287258Abstract: The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate.Type: ApplicationFiled: January 21, 2011Publication date: November 15, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Ruriko Tsuneta, Hideki Kikuchi
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Publication number: 20120104253Abstract: A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among plural images (S1); capturing a save image while correcting the drift on the basis of the approximation function (S2); and creating from the save image a target image in which the effect of the sample drift is reduced (S3). This makes it possible to smooth the random errors in the visual field shift measurements by approximating the sample drift to the function and also to predict the sample drift changing over time. Therefore, it is possible to provide a charged particle beam device in which the effect of the sample drift is very limited even in a high magnification and also provide a measuring method using the charged particle beam device.Type: ApplicationFiled: June 1, 2010Publication date: May 3, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Ruriko Tsuneta, Hideki Kikuchi, Takafumi Yotsuji
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Patent number: 7863564Abstract: An electric charged particle beam microscope is provided in which a specimen movement due to a specimen rotation is classified into a repeatable movement and a non-repeatable movement, a model of movement is determined for the repeatable movement, a range of movement is determined for the non-repeatable movement, the repeatable movement is corrected on the basis of the movement model through open-loop and the non-repeatable movement is corrected under a condition set on the basis of the range of movement.Type: GrantFiled: October 28, 2008Date of Patent: January 4, 2011Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hideki Kikuchi, Takafumi Yotsuji, Toshie Yaguchi
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Patent number: 7633064Abstract: An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a first magnification is measured as an absolute distortion based on a standard specimen having a cyclic structure. A microscopic structure specimen is photographed at a geometric distortion measured first magnification and at a geometric distortion unmeasured second magnification. The image at the first magnification is equally transformed to the second magnification to generate a scaled image. The geometric distortion at the second magnification is measured as a relative distortion based on the scaled image. The absolute distortion at the second magnification is obtained on the basis of the absolute distortion at the first magnification and the relative distortion at the second magnification.Type: GrantFiled: July 5, 2007Date of Patent: December 15, 2009Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Masanari Koguchi, Hiromi Inada
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Publication number: 20090127474Abstract: An electric charged particle beam microscope is provided in which a specimen movement due to a specimen rotation is classified into a repeatable movement and a non-repeatable movement, a model of movement is determined for the repeatable movement, a range of movement is determined for the non-repeatable movement, the repeatable movement is corrected on the basis of the movement model through open-loop and the non-repeatable movement is corrected under a condition set on the basis of the range of movement.Type: ApplicationFiled: October 28, 2008Publication date: May 21, 2009Inventors: Ruriko TSUNETA, Hideki Kikuchi, Takafumi Yotsuji, Toshie Yaguchi
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Publication number: 20080283748Abstract: An electron microscope for simultaneously adjusting the tilt, rotation and temperature of the specimen, and rapidly heating a desired localized section of the specimen. Specimen holders support the specimen on one side, and contain a space on the other side. A laser beam mechanism for heating the vicinity of the specimen irradiates a focused laser beam onto the specimen from this space. The output from a light position sensor installed in the specimen holders is utilized to adjust the irradiation position of the focused laser beam by controlling a fine motion mechanism for inputting light into the vicinity of the specimen stand.Type: ApplicationFiled: December 21, 2007Publication date: November 20, 2008Inventors: Takao Matsumoto, Ruriko Tsuneta, Masanari Koguchi
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Patent number: 7372051Abstract: Magnification errors are reduced in the required range of magnification in electric charged particle beam application apparatuses and critical dimension measurement instruments. To achieve this, a first image, whose magnification for the specimen is actually measured, is recorded, a second image, whose magnification for the specimen is unknown, is recorded, and the magnification of the second image for the first image is analyzed by using image analysis. Thereby, the magnification of the second image for the specimen is actually measured. Then, magnification is actually measured in the whole range of magnification by repeating the magnification analysis described above by taking the second image as the first image. Actually measuring the magnification of images for the specimen in the whole range of magnification and calibrating the same permits a reduction of magnification errors by a digit.Type: GrantFiled: July 27, 2005Date of Patent: May 13, 2008Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hiromi Inada, Masanari Koguchi, Takahito Hashimoto
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Patent number: 7372029Abstract: A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted electron. The scanning transmission electron microscope includes an electron-optics system which enables switching back the transmitted electron beam to the optical axis by a predetermined quantity, and a determining unit for determining the quantity based on a displacement of the transmitted electron with respect to the detector caused by the scanning of the primary electron beam.Type: GrantFiled: May 30, 2007Date of Patent: May 13, 2008Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Masanari Koguchi, Takahito Hashimoto, Kuniyasu Nakamura
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Publication number: 20080093551Abstract: An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a first magnification is measured as an absolute distortion based on a standard specimen having a cyclic structure. A microscopic structure specimen is photographed at a geometric distortion measured first magnification and at a geometric distortion unmeasured second magnification. The image at the first magnification is equally transformed to the second magnification to generate a scaled image. The geometric distortion at the second magnification is measured as a relative distortion based on the scaled image. The absolute distortion at the second magnification is obtained on the basis of the absolute distortion at the first magnification and the relative distortion at the second magnification.Type: ApplicationFiled: July 5, 2007Publication date: April 24, 2008Inventors: Ruriko TSUNETA, Masanari Koguchi, Hiromi Inada
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Publication number: 20080067374Abstract: In a specimen analyzing apparatus such as a transmission electron microscope for analyzing the structure, composition and electron state of an observing specimen in operation by applying external voltage to the specimen to be observed, a specimen support (mesh) including a mesh electrode connectable to external voltage applying portions of the specimen and a specimen holder including a specimen holder electrode connectable to the mesh electrode and current inlet terminals as well are provided. Voltage is applied externally of the specimen analyzing apparatus to the external voltage applying portions of the specimen through the medium of the specimen holder electrode and mesh electrode.Type: ApplicationFiled: May 8, 2007Publication date: March 20, 2008Inventors: Shiano Ono, Masanari Koguchi, Ruriko Tsuneta
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Publication number: 20070274593Abstract: A specified position in an array structure in which a reference pattern is displayed repetitively through reference pattern counting is identified. In an array structure image, the pattern detection estimating area generated from a starting point, the address of the starting point, and a unit vector are compared with a pattern detected position found in pattern matching with the reference pattern image, to execute pattern counting while determining correct detection, oversights, wrong detection, etc. Array structure images are photographed sequentially while moving the visual field with the use of an image shifting deflector to continue the pattern counting started at the starting point to identify the ending point specified with an address. If the ending point is not reached only with use of the image shifting deflector, the visual field moving range of the image shifting deflector is moved with use of a specimen stage.Type: ApplicationFiled: February 8, 2007Publication date: November 29, 2007Inventors: Ruriko Tsuneta, Tohru Ando, Junzo Azuma
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Publication number: 20070228277Abstract: A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted electron. The scanning transmission electron microscope includes an electron-optics system which enables switching back the transmitted electron beam to the optical axis by a predetermined quantity, and a determining unit for determining the quantity based on a displacement of the transmitted electron with respect to the detector caused by the scanning of the primary electron beam.Type: ApplicationFiled: May 30, 2007Publication date: October 4, 2007Inventors: Ruriko Tsuneta, Masanari Koguchi, Takahito Hashimoto, Kuniyasu Nakamura
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Patent number: 7227144Abstract: A scanning transmission electron microscope which enhances correction accuracy of a de-scanning coil for canceling a transmitted-electron-beam position change on an electron detector. Here, this transmitted-electron-beam position change appears in accompaniment with a primary-electron-beam position change on a specimen caused by a scanning coil. First, control over the scanning coil is digitized. Moreover, while being synchronized with a digital control signal resulting from this digitization, values in a de-scanning table registered in a FM(2) are outputted to the de-scanning coil. Here, the de-scanning table is created as follows: Diffraction images before and after activating the scanning coil and the de-scanning coil are photographed using a camera. Then, based on a result acquired by analyzing a resultant displacement quantity of the diffraction images by the image processing, the de-scanning table is created.Type: GrantFiled: January 10, 2006Date of Patent: June 5, 2007Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Masanari Koguchi, Takahito Hashimoto, Kuniyasu Nakamura