Patents by Inventor Ruslan Kvetny

Ruslan Kvetny has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11830730
    Abstract: There is provided a method and apparatus for forming a layer, by sequentially repeating a layer deposition cycle to process a substrate disposed in a reaction chamber. The deposition cycle comprising: supplying a first precursor into the reaction chamber for a first pulse period; supplying a second precursor into the reaction chamber for a second pulse period. At least one of the first and second precursors may be supplied into the reaction chamber for a pretreatment period longer than the first or second pulse period before sequentially repeating the deposition cycles.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: November 28, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Arjen Klaver, Werner Knaepen, Lucian Jdira, Gido van der Star, Ruslan Kvetny
  • Publication number: 20190066997
    Abstract: There is provided a method and apparatus for forming a layer, by sequentially repeating a layer deposition cycle to process a substrate disposed in a reaction chamber. The deposition cycle comprising: supplying a first precursor into the reaction chamber for a first pulse period; supplying a second precursor into the reaction chamber for a second pulse period. At least one of the first and second precursors may be supplied into the reaction chamber for a pretreatment period longer than the first or second pulse period before sequentially repeating the deposition cycles.
    Type: Application
    Filed: August 29, 2017
    Publication date: February 28, 2019
    Inventors: Arjen Klaver, Werner Knaepen, Lucian Jdira, Gido van der Star, Ruslan Kvetny