Patents by Inventor Rusmin Kudinar
Rusmin Kudinar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9389408Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.Type: GrantFiled: June 29, 2011Date of Patent: July 12, 2016Assignee: Zeta Instruments, Inc.Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
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Publication number: 20150226952Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.Type: ApplicationFiled: April 21, 2015Publication date: August 13, 2015Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
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Publication number: 20150226953Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.Type: ApplicationFiled: April 21, 2015Publication date: August 13, 2015Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
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Patent number: 9036869Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.Type: GrantFiled: August 29, 2011Date of Patent: May 19, 2015Assignee: Zeta Instruments, Inc.Inventors: Ken Kinsun Lee, Ronny Soetarman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
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Patent number: 8976366Abstract: A measurement system for monitoring an LED chip surface roughening process is described. A reflective illuminator can run reflectance measurements. A vertical positioning means can adjust a distance between an objective lens and an industrial sample. A horizontal positioning means can move objects in XY plane, and is specifically configured to hold the industrial sample and a reference sample. An optical sensor can acquire images of the industrial sample. A spectrometer can acquire reflectance spectrums of the industrial sample and the reference sample. A processor can control these components. The processor can perform deskew, and calculate an average reflectance and an oscillation amplitude from the reflectance spectrums of the industrial sample.Type: GrantFiled: June 12, 2012Date of Patent: March 10, 2015Assignee: Zeta Instruments, Inc.Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
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Patent number: 8896825Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second lens, a field stop, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The first lens focuses scattered radiation from the sample to generate multiple scan lines at a first focal plane. The field stop is positioned at the first focal plane to block one or more scan lines at the first focal plane. The scan line not blocked by the field stop propagates to the second lens. The second lens de-scans the scan line and generates a point of scattered radiation at a second focal plane where the detector input is located.Type: GrantFiled: February 1, 2013Date of Patent: November 25, 2014Assignee: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Publication number: 20140307255Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.Type: ApplicationFiled: April 12, 2013Publication date: October 16, 2014Applicant: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Patent number: 8848181Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.Type: GrantFiled: April 12, 2013Date of Patent: September 30, 2014Assignee: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Patent number: 8836935Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a blocker, a focusing lens, an aperture, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a transparent sample. A portion of the source beam travels through the transparent sample to another surface. The blocker blocks scattered radiation originating at the other surface. Scattered radiation originating from the transparent sample is not redirected by the blocker and is focused by the focusing lens to a first focal plane. The focused scattered radiation passes through the aperture before irradiating the detector. The detector output an intensity measurement of the scattered radiation that irradiates the detector.Type: GrantFiled: April 12, 2013Date of Patent: September 16, 2014Assignee: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Patent number: 8830456Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating mirror, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating mirror and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.Type: GrantFiled: February 1, 2013Date of Patent: September 9, 2014Assignee: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Patent number: 8830457Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first waveplate, a second waveplate, a polarizing beam splitter, and a detector. The radiating source irradiates the first waveplate with a linearly polarized source beam generating a circularly polarized source beam, which irradiates a first position of on the time varying beam reflector. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a transparent sample. The reflected radiation from the transparent sample is directed via the telecentric lens and the time varying beam reflector to the second waveplate, which converts circularly polarized reflected radiation to linearly polarized reflected radiation including radiation that is vertically polarized and radiation that is horizontally polarized.Type: GrantFiled: April 12, 2013Date of Patent: September 9, 2014Assignee: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Publication number: 20140218722Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second lens, a field stop, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The first lens focuses scattered radiation from the sample to generate multiple scan lines at a first focal plane. The field stop is positioned at the first focal plane to block one or more scan lines at the first focal plane. The scan line not blocked by the field stop propagates to the second lens. The second lens de-scans the scan line and generates a point of scattered radiation at a second focal plane where the detector input is located.Type: ApplicationFiled: February 1, 2013Publication date: August 7, 2014Applicant: Zeta Instruments, Inc.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Publication number: 20140218724Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating minor, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating minor and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.Type: ApplicationFiled: February 1, 2013Publication date: August 7, 2014Applicant: ZETA INSTRUMENTS, INC.Inventors: Steven W. Meeks, Rusmin Kudinar, Hung P. Nguyen
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Patent number: 8498184Abstract: A media processing system for processing media having differing properties, the media processing system having a base. The base has a base radial alignment portion, a base vertical alignment portion, and a base retention portion. A set of removable media clamps is included, where each of the set of removable media clamps is adapted for the differing properties of the media, each removable media clamp has a removable media clamp radial alignment portion for engaging the base radial alignment portion and radially aligning the removable media clamp with the base, a removable media clamp vertical alignment portion for engaging the base vertical alignment portion and vertically aligning the removable media clamp with the base, and a media engagement portion for engaging the media. The retention portion is controllable by the media processing system to selectively retain and release a mounted one of the removable media clamps without manual intervention.Type: GrantFiled: June 4, 2009Date of Patent: July 30, 2013Assignee: KLA-Tencor CorporationInventors: Rusmin Kudinar, Alireza Shahdoostmoghadam, Arthur Kwun, Hung Nguyen, Darren Seawright, Robert Ocheltree, Frederick Miller
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Publication number: 20120327414Abstract: A measurement system for monitoring an LED chip surface roughening process is described. A reflective illuminator can run reflectance measurements. A vertical positioning means can adjust a distance between an objective lens and an industrial sample. A horizontal positioning means can move objects in XY plane, and is specifically configured to hold the industrial sample and a reference sample. An optical sensor can acquire images of the industrial sample. A spectrometer can acquire reflectance spectrums of the industrial sample and the reference sample. A processor can control these components. The processor can perform deskew, and calculate an average reflectance and an oscillation amplitude from the reflectance spectrums of the industrial sample.Type: ApplicationFiled: June 12, 2012Publication date: December 27, 2012Applicant: Zeta Instruments, Inc.Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
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Publication number: 20120176475Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).Type: ApplicationFiled: December 21, 2011Publication date: July 12, 2012Applicant: Zeta Instruments, Inc.Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
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Publication number: 20120051660Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.Type: ApplicationFiled: August 29, 2011Publication date: March 1, 2012Applicant: Zeta Instruments, Inc.Inventors: Ken Kinsun Lee, Ronny Soetarman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandia, Ben Garland
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Publication number: 20120019626Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.Type: ApplicationFiled: June 29, 2011Publication date: January 26, 2012Applicant: Zeta Instruments, Inc.Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
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Patent number: 7656519Abstract: In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.Type: GrantFiled: August 30, 2007Date of Patent: February 2, 2010Assignee: KLA-Tencor CorporationInventors: Steven W. Meeks, Rusmin Kudinar
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Patent number: 7532318Abstract: In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.Type: GrantFiled: November 16, 2006Date of Patent: May 12, 2009Assignee: KLA-Tencor CorporationInventors: Steven W. Meeks, Rusmin Kudinar, William R. Wheeler, Hung Phi Nguyen, Vamsi Velidandla, Anoop Somanchi, Ronny Soetarman