Patents by Inventor Russell A. Chorush

Russell A. Chorush has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for inline removal of impurities from wet chemicals
    Patent number: 6200478
    Abstract: An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: March 13, 2001
    Assignee: Texas Instruments Incorporated
    Inventors: Russell A. Chorush, Jeremiah D. Hogan
  • Apparatus and method for measuring contaminants in semiconductor processing chemicals
    Patent number: 6032513
    Abstract: An trace analyzer apparatus and method useful in semiconductor processing for measuring trace impurities in gases and liquids comprising a gas chromatograph serving to replace a bulk gas in a composition of bulk gas including contaminants in a bulk gas stream with a carrier gas having a higher ionization potential than that of said contaminants, where such gas chromatograph is connected to a hollow electrode (14) for initiating ionization of said contaminants by electrical discharge, where such electrode is electrically isolated from a source housing (44) and adjacent to a skimmer plate (16) that ionizes trace contaminants that are measured using a mass spectrometer, is disclosed.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: March 7, 2000
    Assignee: Texas Instruments Incorporated
    Inventors: Russell A. Chorush, Jeremiah D. Hogan, Deepta Varadarajan
  • Apparatus and method for inline removal of impurities from wet chemicals
    Patent number: 6017453
    Abstract: An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: January 25, 2000
    Assignee: Texas Instruments Incorporated
    Inventors: Russell A. Chorush, Jeremiah D. Hogan