Patents by Inventor Russell A. Morgan

Russell A. Morgan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040058705
    Abstract: The present invention describes a docking module for a cellular telephone which allows the cellular telephone and docking module to function as a secure point-of-sale system to accept payment via credit card, debit card, ATM card, stored value (Gift) card, phone card, as either magnetic swipe cards or IC cards, for sales or service transactions, as well as activate or recharge phone cards, activate or recharge stored value (Gift) cards, and activate or recharge IC cards. The secure point-of-sale system will also perform check validation sequences that will allow checks to be safely accepted for sales and service transactions. The docking module includes a docking module control assembly with a microprocessor that controls a magnetic credit card reader, an IC card reader/writer, a thermal docket printer, a multifunction security access module (SAM) and battery.
    Type: Application
    Filed: December 21, 2001
    Publication date: March 25, 2004
    Inventors: Russell Morgan, Adam Hemsley
  • Patent number: 5674566
    Abstract: The proposal is for a process and device for machining plate-like workpieces, especially silicon wafers or glass masks by coating the surface with a liquid, making use of capillary forces to distribute the liquid over the surface. To this end, a narrow slit is formed in which capillary forces act on the liquid. Features of the process are low liquid consumption and insensitivity to soiling.
    Type: Grant
    Filed: December 15, 1995
    Date of Patent: October 7, 1997
    Inventors: Russell Morgan, Thomas Bachtle
  • Patent number: 4764247
    Abstract: The fabrication of improved semiconductor devices having photoresist materials in the form of silicon containing polystyrene copolymers of a halomethylstyrene and an alkylsilylstyrene and the resulting improved semiconductor wafer device containing silicon prior to etching; the resulting resist having reduced resist erosion and improved plasma resiliency.
    Type: Grant
    Filed: March 18, 1987
    Date of Patent: August 16, 1988
    Assignee: Syn Labs, Inc.
    Inventors: Carina T. Leveriza, Russell A. Morgan