Patents by Inventor Russell F. Anderson

Russell F. Anderson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6743943
    Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical selected from R1—CnHm—, R1—CnHm—C(═O)—, R1—CnHm—CH[—O—X—O—CH═CH2—], R1—CnHm—CH[—O—X—O—CH═CH2—]C(═O)—, R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—], R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—]C(═O)—, R1—[CFCl—CF2—]pCH2— and HCFCl—CF2—, wherein R1 is hydrogen, an unsubstituted or substituted fluorinated aliphatic radical, an unsubstituted or substituted fluorinated cyclic aliphatic radical, an unsubstituted or substituted fluorinated aromatic radical, an unsubstituted or substituted fluorinated araliphatic radical, or an unsubstituted or substituted fluorinated heterocyclic rad
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: June 1, 2004
    Assignee: Honeywell International Inc.
    Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzman, Ellen L. Swan
  • Publication number: 20010034458
    Abstract: Vinyl ether compounds having the formula:
    Type: Application
    Filed: May 11, 2001
    Publication date: October 25, 2001
    Applicant: AlliedSignal Inc.
    Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzmann, Ellen L. Swan
  • Patent number: 6291704
    Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical selected from R1—CnHm—, R1—CnHm—C(═O)—, R1—CnHm—CH[—O—X—O—CH═CH2—], R1—CnHm—CH[—O—X—O—CH═CH2—]C(═O)—, R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—], R1—CnHm—CH[—C(═O)—O—X—0—CH═CH2—]C(═O)—, R1—[CFCl—CF2—]pCH2— and HCFCl—CF2—, wherein R1 is hydrogen, an unsubstituted or substituted fluorinated aliphatic radical, an unsubstituted or substituted fluorinated cyclic aliphatic radical, an unsubstituted or substituted fluorinated aromatic radical, an unsubstituted or substituted fluorinated araliphatic radical, or an unsubstituted or substituted fluorinated heterocyclic radi
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: September 18, 2001
    Assignee: AlliedSignal Inc.
    Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzman, Ellen L. Swan
  • Patent number: 6054250
    Abstract: The present invention relates to polymer precursors used in sterolithography. Specifically, the invention provides a novel resin having a glass transition temperature (Tg) that is substantially higher than any existing resins. The polymer precursors comprise an admixture of at least one vinyl ether, functionalized compound and at least one epoxy functionalized compound, at least one acrylate functionalized compound, and a photoinitiator, wherein the polymer precursor composition cures by a dual cure mechanism utilizing a free radical pathway as well as a cationic pathway thus yielding improved green strength.
    Type: Grant
    Filed: January 26, 1998
    Date of Patent: April 25, 2000
    Assignee: AlliedSignal Inc.
    Inventors: Eugene V. Sitzmann, Russell F. Anderson, Mathias P. Koljack, Julietta G. Cruz, Chandra M. Srivastava
  • Patent number: 5494618
    Abstract: Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator and an ultraviolet light-absorbing compound to provide a predetermined depth of cure. Preferably, the ultraviolet light-absorbing compound is anthracene or its derivatives.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: February 27, 1996
    Assignee: AlliedSignal Inc.
    Inventors: Eugene V. Sitzmann, Russell F. Anderson, Darryl K. Barnes