Abstract: Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than 200° C.

Abstract: A spectroscopic polarimeter and methods of manufacturing the same are provided. The spectroscopic polarimeter is described as being fabricated by etching or patterning grooves into a substrate with a centrally smooth area, laying down an opaque thin layer of metal, etching out a central cavity from the metal, laying down a thin layer of dielectric material, and then laying down metal over the cavity. Optionally, before or after the dielectric layer is laid, a thicker metal barrier at the edge of the design can be laid as well.

Abstract: A spectroscopic polarimeter and methods of manufacturing the same are provided. The spectroscopic polarimeter is described as being fabricated by etching or patterning grooves into a substrate with a centrally smooth area, laying down an opaque thin layer of metal, etching out a central cavity from the metal, laying down a thin layer of dielectric material, and then laying down metal over the cavity. Optionally, before or after the dielectric layer is laid, a thicker metal barrier at the edge of the design can be laid as well.

Abstract: A near-field scanning optical microscope system exposes photoresist on a substrate. The system includes an NSOM probe, and translational stages capable of moving one of the probe and the substrate such that the probe traverses, in continuous motion, over the entire substrate. Another near-field scanning optical microscope system exposes photoresist on a substrate using an array of NSOM probes. Methods for exposing photoresist on a substrate include the steps of translating a surface of the substrate across an NSOM probe (or an array of NSOM probes) in continuous motion.

Abstract: A plasmon enhanced near-field optical probe has an optical coupler with an end face and a metal coating forming at least one plasmon enhancement structure. An extension provides probe-to-sample separation feedback. A microscope cantilever has a lever arm with an aperture, a tip to provide tip-to-sample separation feedback, and a plasmon enhancement structure. An air bearing slider apparatus has a base, air bearing slider pads, and a metal film forming a plasmon enhancement structure about an aperture. A plasmon enhanced optical probe end cap has a socket with an entry aperture for an optical fiber and an exit aperture with a plasmon enhanced transmission structure. A positioning subsystem has a piezoelectric member that adjusts a length of the positioning subsystem, and a quadranted piezo device that adjusts a position of the positioning subsystem.