Patents by Inventor Russell J. Serino

Russell J. Serino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5457005
    Abstract: A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
    Type: Grant
    Filed: July 2, 1993
    Date of Patent: October 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino
  • Patent number: 5286599
    Abstract: A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: February 15, 1994
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino, David F. Witman
  • Patent number: 5229251
    Abstract: A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: July 20, 1993
    Assignee: International Business Machines Corp.
    Inventors: Edward D. Babich, Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino