Patents by Inventor Russell Low

Russell Low has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9400667
    Abstract: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: July 26, 2016
    Assignee: International Business Machines Corporation
    Inventors: Curtis E. Hrischuk, Andrew Russell Low, Peter Duncan Shipton, John Joseph Stecher
  • Patent number: 8881149
    Abstract: A method for providing control of Java resource runtime usage may include establishing communication with one or more Java virtual machines (JVMs) forming a hive via a hive communication channel where the hive comprises a plurality of JVMs configured to enable utilization of at least one shared resource, receiving, via the hive communication channel, environmental information indicative of hive activity relative to the at least one shared resource from at least one of the one or more JVMs, and adapting, via processing circuitry, operations associated with use of the at least one shared resource based on the environmental information.
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: November 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Michael Hilton Dawson, Andrew Russell Low, Prashanth Kattige Nageshappa, Balbir Singh
  • Patent number: 8881151
    Abstract: A method for providing control of Java resource runtime usage may include establishing communication with one or more Java virtual machines (JVMs) forming a hive via a hive communication channel where the hive comprises a plurality of JVMs configured to enable utilization of at least one shared resource, receiving, via the hive communication channel, environmental information indicative of hive activity relative to the at least one shared resource from at least one of the one or more JVMs, and adapting, via processing circuitry, operations associated with use of the at least one shared resource based on the environmental information.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: November 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Michael Hilton Dawson, Andrew Russell Low, Prashanth Kattige Nageshappa, Balbir Singh
  • Patent number: 8839215
    Abstract: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.
    Type: Grant
    Filed: July 19, 2010
    Date of Patent: September 16, 2014
    Assignee: International Business Machines Corporation
    Inventors: Curtis E. Hrischuk, Andrew Russell Low, Peter Duncan Shipton, John Joseph Stecher
  • Publication number: 20140115585
    Abstract: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.
    Type: Application
    Filed: December 20, 2013
    Publication date: April 24, 2014
    Applicant: IBM CORPORATION
    Inventors: Curtis E. HRISCHUK, Andrew Russell LOW, Peter Duncan SHIPTON, John Joseph STECHER
  • Patent number: 8627303
    Abstract: A method, computer program product, and system for memory optimization by partitioning extraneous information from executable virtual machine code or interpreted code. The extraneous information may be stored separately, or accessed from the original code if needed for debugging or servicing the code in the field. This approach optimizes memory usage by reducing memory footprint while maintaining accessibility of the non-executable information for debugging and other processes necessary for servicing code in the field.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: January 7, 2014
    Assignee: International Business Machines Corporation
    Inventors: Henry Walton Adams, III, Sean Christopher Foley, Curtis E. Hrischuk, Andrew Russell Low, Peter Duncan Shipton
  • Publication number: 20130275976
    Abstract: A method for providing control of Java resource runtime usage may include establishing communication with one or more Java virtual machines (JVMs) forming a hive via a hive communication channel where the hive comprises a plurality of JVMs configured to enable utilization of at least one shared resource, receiving, via the hive communication channel, environmental information indicative of hive activity relative to the at least one shared resource from at least one of the one or more JVMs, and adapting, via processing circuitry, operations associated with use of the at least one shared resource based on the environmental information.
    Type: Application
    Filed: May 9, 2013
    Publication date: October 17, 2013
    Inventors: Michael Hilton DAWSON, Andrew Russell Low, Prashanth Kattige Nageshappa, Balbir Singh
  • Publication number: 20120244692
    Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
    Type: Application
    Filed: June 5, 2012
    Publication date: September 27, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Nicholas Bateman, Kevin Daniels, Atul Gupta, Russell Low, Benjamin Riordon, Robert Mitchell, Steven Anella
  • Publication number: 20120183199
    Abstract: A method of identifying individual silicon substrates, and particularly solar cells, is disclosed. Every solar cell possesses a unique set of optical properties. The method identifies these properties and stores them in a database, where they can be associated to a particular solar cell. Unlike conventional tracking techniques, the present method requires no dedicated space on the surface of the silicon substrate. This method allows substrates to be tracked through the manufacturing process, as well as throughout the life of the substrate.
    Type: Application
    Filed: January 14, 2011
    Publication date: July 19, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Benjamin Riordon, Russell Low
  • Patent number: 8216923
    Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: July 10, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Nicholas Bateman, Kevin Daniels, Atul Gupta, Russell Low, Benjamin Riordon, Robert Mitchell, Steven Anella
  • Publication number: 20120083102
    Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
    Type: Application
    Filed: October 1, 2010
    Publication date: April 5, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Nicholas Bateman, Kevin Daniels, Atul Gupta, Russell Low, Benjamin Riordon, Robert Mitchell, Steven Anella
  • Patent number: 8143604
    Abstract: An ion implantation system includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulator system. The insulator system is configured to electrically insulate the terminal structure and is configured to provide an effective dielectric strength greater than about 72 kilovolts (kV)/inch in a region proximate at least one exterior surface of the terminal structure. A gas box insulator system to electrically insulate a gas box of the ion implantation system is also provided.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: March 27, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Russell Low, Piortr R. Lubicki, D. Jeffrey Lischer, Steve Krause, Eric Hermanson, Joseph C. Olson
  • Publication number: 20120017204
    Abstract: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.
    Type: Application
    Filed: July 19, 2010
    Publication date: January 19, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Curtis E. Hrischuk, Andrew Russell Low, Peter Duncan Shipton, John Joseph Stecher
  • Patent number: 8084293
    Abstract: An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: December 27, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Benjamin Riordon, Russell Low, Atul Gupta, William Weaver
  • Publication number: 20110244625
    Abstract: An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
    Type: Application
    Filed: April 6, 2010
    Publication date: October 6, 2011
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Benjamin Riordon, Russell Low, Atul Gupta, William Weaver
  • Publication number: 20110131561
    Abstract: A method, computer program product, and system for memory optimization by partitioning extraneous information from executable virtual machine code or interpreted code. The extraneous information may be stored separately, or accessed from the original code if needed for debugging or servicing the code in the field. This approach optimizes memory usage by reducing memory footprint while maintaining accessibility of the non-executable information for debugging and other processes necessary for servicing code in the field.
    Type: Application
    Filed: November 30, 2009
    Publication date: June 2, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Henry Walton Adams, III, Sean Christopher Foley, Curtis E. Hrischuk, Andrew Russell Low, Peter Duncan Shipton
  • Publication number: 20110124186
    Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.
    Type: Application
    Filed: November 16, 2010
    Publication date: May 26, 2011
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Anthony Renau, Ludovic Godet, Timothy J. Miller, Joseph C. Olson, Vikram Singh, James Buonodono, Frank Sinclair, Deepak A. Ramappa, Russell Low, Atul Gupta, Kevin M. Daniels
  • Patent number: 7887034
    Abstract: A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
    Type: Grant
    Filed: August 1, 2005
    Date of Patent: February 15, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Stephen Krause, Eric R. Cobb, Russell Low
  • Publication number: 20100184250
    Abstract: An improved method of doping substrates, such as a solar cell, is disclosed. Conductors, such as metal lines, are often deposited on the surface of a substrate. In some embodiments, the conductivity of the substrate beneath the conductors is different than the conductivity of other regions of the substrate. Therefore, the conductors can serve as the mask for a subsequent blanket doping, which changes the conductivity of the surface of the substrate, except beneath the conductors. In some embodiments, an initial blanket doping is performed prior to the deposition of the conductors to create an initial uniformly doped region.
    Type: Application
    Filed: January 18, 2010
    Publication date: July 22, 2010
    Inventors: Julian Blake, Russell Low
  • Patent number: 7576337
    Abstract: A power supply system for an ion implantation system. In one particular exemplary embodiment, the system may be realized as a power supply system that includes a low frequency power inverter, a stack driver and a high voltage power generation unit that receives source power from the power inverter. The high voltage generation unit may include a high voltage transformer for providing an output power that is multiplied to a desired output level and delivered to an input terminal of an ion beam accelerator. The power supply system may also include a dielectric enclosure that encases at least a portion of the high voltage power generation unit, thereby preventing variation in the break down strength of the internal components.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: August 18, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Piotr Lubicki, Russell Low, Steve Krause, Eric Hermanson