Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: An image generator having an illuminator, a reflective display device (in one embodiment) and a beamsplitter which produces a virtual image of an image created in a light modulating medium on said reflective display device. In one embodiment, the image generator is a miniature image generator for a relatively small, lightweight head-mounted display which provides a magnified virtual image which is viewed by a viewer. The beamsplitter is optically coupled to the reflective display device. The beamsplitter comprises a film having a plurality of layers including at least a first layer which comprises an oriented birefringent material. The beamsplitter has a wide angle of acceptance.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

Abstract: An image generator having an illuminator, a reflective display device (in one embodiment) and a beamsplitter which produces a virtual image of an image created in a light modulating medium on said reflective display device. In one embodiment, the image generator is a miniature image generator for a relatively small, lightweight head-mounted display which provides a magnified virtual image which is viewed by a viewer. The beamsplitter is optically coupled to the reflective display device. The beamsplitter comprises a film having a plurality of layers including at least a first layer which comprises an oriented birefringent material. The beamsplitter has a wide angle of acceptance.

Abstract: Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

Abstract: A miniature display system uses a reflective micro-display that reflects light perpendicular to the surface of the display to generate an image. Light from an off-axis light source is polarized and reflected by a prism to provide on-axis illumination light for the display. The prism uses total internal reflection and/or a polarizer as a beam splitting surface so as to increase the brightness of the image generated by the display. The optical system provides a virtual image with a large field of view so that the small display system can be used in portable, hand-held or head mounted systems to display a large amount of information to the user.

Abstract: A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.

Abstract: An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

Abstract: A miniature display system uses a reflective micro-display that reflects light perpendicular to the surface of the display to generate an image. Light from an off-axis light source is polarized and reflected by a prism to provide on-axis illumination light for the display. The prism uses total internal reflection and/or a polarizer as a beam splitting surface so as to increase the brightness of the image generated by the display. The optical system provides a virtual image with a large field of view so that the small display system can be used in portable, hand-held or head mounted systems to display a large amount of information to the user.

Abstract: An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

Abstract: A catadioptric zoom lens assembly has a catoptric objective lens group with a forwardly facing primary mirror and a rearwardly facing first surface reflecting secondary mirror located forwardly of the primary mirror to create an intermediate image forwardly of the primary mirror. A zoom relay lens group is located optically rearwardly of the intermediate image and has a stationary field lens subgroup, a first movable lens subgroup and a second movable lens subgroup.