Patents by Inventor Russell M. Pon

Russell M. Pon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100033716
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: October 2, 2009
    Publication date: February 11, 2010
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Publication number: 20080285023
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: June 23, 2008
    Publication date: November 20, 2008
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Publication number: 20040223146
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: June 17, 2004
    Publication date: November 11, 2004
    Applicant: KLA INSTRUMENTS CORPORATION
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Publication number: 20040017562
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: July 28, 2003
    Publication date: January 29, 2004
    Applicant: KLA INSTRUMENTS CORPORATION
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Patent number: 6624885
    Abstract: A method for inspecting small holes in a material is disclosed. The method comprises directing a light source through the holes in the material, and then focusing the light passing through the material onto a CCD detector. The focusing techniques allow for a reduction in the size of the image which must be inspected, thereby increasing sample throughput, while still allowing for detailed inspection of the hole number and quality. Methods of producing an aerosolization container and device comprising membranes which pass such an inspection are also provided.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: September 23, 2003
    Assignee: Aradigm Corporation
    Inventors: Russell M. Pon, Rajesh S. Patel, James M. Bovatsek, Jeffrey A. Schuster, Geoffrey K. McKinley, Sze-The Young
  • Patent number: 6551542
    Abstract: A method for producing a nozzle useful in generating a fine aerosol for delivery of therapeutic or diagnostic agents is provided. The method comprises focusing a laser source onto a thin, preferably flexible material so as to form pores substantially through the material. The pores are formed to have an unflexed exit aperture diameter in the range of about 0.5 to about 25 microns, depending on the size of the aerosol particles desired for a particular application. The nozzle may have a variety of shapes and be distributed in a variety of patterns. An elevated area can be formed around the exit aperture of the nozzle in order to prevent intrusion of liquid into the nozzle.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: April 22, 2003
    Assignee: Aradigm Corporation
    Inventors: Rajesh S. Patel, Sudarsan Srinivasan, Russell M. Pon, Jeffrey A. Schuster, Igor Gonda
  • Publication number: 20030063274
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: November 7, 2002
    Publication date: April 3, 2003
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Publication number: 20020054291
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Application
    Filed: November 5, 2001
    Publication date: May 9, 2002
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Patent number: 6078386
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Grant
    Filed: July 13, 1998
    Date of Patent: June 20, 2000
    Assignee: KLA Instruments Corporation
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
  • Patent number: 5822055
    Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
    Type: Grant
    Filed: June 27, 1997
    Date of Patent: October 13, 1998
    Assignee: KLA Instruments Corporation
    Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon