Abstract: A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent.

Abstract: A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent.

Abstract: A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent.

Abstract: An ultrasonic cleaning tank for use in cleaning electronic parts having a top portion and a bottom portion operably divided by a perforated dispersion plate. The cleaning tank is assembled to avoid internal projections or obstructions within the top portion to create a piston-like, laminar flow region. The dispersion plate is constructed to provide a backpressure within the bottom portion so as to promote even flow of a cleaning fluid through the perforations. The cleaning fluid flows upward past an electronic part. At the same time, an ultrasonic transducer supplies ultrasonic energy within the cleaning fluid creating cavitation such that any particulate matter is scrubbed from the electronic parts. The particulates are subsequently carried upward by the laminar flow and over a tank lip. The cleaning tank can be used in either a batch or recirculating mode.

Abstract: An ultrasonic cleaning tank for use in cleaning electronic parts having a top portion and a bottom portion operably divided by a perforated dispersion plate. The cleaning tank is assembled to avoid internal projections or obstructions within the top portion to create a piston-like, laminar flow region. The dispersion plate is constructed to provide a backpressure within the bottom portion so as to promote even flow of a cleaning fluid through the perforations. The cleaning fluid flows upward past an electronic part. At the same time, an ultrasonic transducer supplies ultrasonic energy within the cleaning fluid creating cavitation such that any particulate matter is scrubbed from the electronic parts. The particulates are subsequently carried upward by the laminar flow and over a tank lip. The cleaning tank can be used in either a batch or recirculating mode.

Abstract: A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent.

Abstract: An ultrasonic cleaning tank for use in cleaning electronic parts having a top portion and a bottom portion operably divided by a perforated dispersion plate. The cleaning tank is assembled to avoid internal projections or obstructions within the top portion to create a piston-like, laminar flow region. The dispersion plate is constructed to provide a backpressure within the bottom portion so as to promote even flow of a cleaning fluid through the perforations. The cleaning fluid flows upward past an electronic part. At the same time, an ultrasonic transducer supplies ultrasonic energy within the cleaning fluid creating cavitation such that any particulate matter is scrubbed from the electronic parts. The particulates are subsequently carried upward by the laminar flow and over a tank lip. The cleaning tank can be used in either a batch or recirculating mode.

Abstract: An ultrasonic cleaning tank for use in cleaning electronic parts having a top portion and a bottom portion operably divided by a perforated dispersion plate. The cleaning tank is assembled to avoid internal projections or obstructions within the top portion to create a piston-like, laminar flow region. The dispersion plate is constructed to provide a backpressure within the bottom portion so as to promote even flow of a cleaning fluid through the perforations. The cleaning fluid flows upward past an electronic part. At the same time, an ultrasonic transducer supplies ultrasonic energy within the cleaning fluid creating cavitation such that any particulate matter is scrubbed from the electronic parts. The particulates are subsequently carried upward by the laminar flow and over a tank lip. The cleaning tank can be used in either a batch or recirculating mode.

Abstract: The present invention provides an improved finishing process and apparatus. In one embodiment, a method and apparatus are provided for finishing a metal article. The method includes cavitationally eroding the metal article to form pits in its external surface. The metal article is also corroded with a corrosion chemical to corrode the pitted metallic surface. In this manner, substantially homogeneously distributed micro-pits can be formed about the article to create a desired matte finish, as well as a surface that is amenable for sealing. In a preferred embodiment, the corrosion chemical is part of a finishing bath that is ultrasonically cavitated for eroding the metal article.