Patents by Inventor Rustam Yevtukhov
Rustam Yevtukhov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190259559Abstract: An ion beam neutralization system, often referred to as a plasma bridge neutralizer (PBN), as part of an ion beam (etch) system. The system utilizes an improved filament thermo-electron emitter PBN design, that when utilized in a particular method of operation, greatly extends filament life and minimizes variation in neutralizer operating parameters for long periods of operation. The PBN includes a solenoidal electromagnetic that produces an axial magnetic field within the PBN and a magnetic concentrator that facilitates the alignment of the magnetic field and inhibits stray fields. The PBN can readily provide a filament lifetime of at least 500 hours.Type: ApplicationFiled: February 7, 2019Publication date: August 22, 2019Inventors: Rustam YEVTUKHOV, Ivan SHKURENKOV, Boris DRUZ, Alan HAYES, Robert HIERONYMI
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Patent number: 10128083Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.Type: GrantFiled: June 1, 2016Date of Patent: November 13, 2018Assignee: VEBCO INSTRUMENTS INC.Inventors: Boris Druz, Rustam Yevtukhov, Robert Hieronymi, Alan V. Hayes, Mathew Levoso, Peter Porshnev
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Patent number: 10014164Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.Type: GrantFiled: May 11, 2017Date of Patent: July 3, 2018Assignee: Veeco Instruments Inc.Inventors: Boris Druz, Rustam Yevtukhov, Rhodri Elliott, James M. Best, Jr., Peter Porshnev
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Publication number: 20170352521Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.Type: ApplicationFiled: June 1, 2016Publication date: December 7, 2017Inventors: Boris Druz, Rustam Yevtukhov, Robert Hieronymi, Alan V. Hayes, Mathew Levoso, Peter Porshnev
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Publication number: 20170330738Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.Type: ApplicationFiled: May 11, 2017Publication date: November 16, 2017Inventors: Boris Druz, Rustam Yevtukhov, Rhodri Elliott, James M. Best, JR., Peter Porshnev
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Patent number: 8835869Abstract: Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.Type: GrantFiled: April 16, 2012Date of Patent: September 16, 2014Assignee: Veeco Instruments, Inc.Inventors: Rustam Yevtukhov, Boris L. Druz, Viktor Kanarov, Alan V. Hayes
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Publication number: 20120211166Abstract: Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.Type: ApplicationFiled: April 16, 2012Publication date: August 23, 2012Applicant: VEECO INSTRUMENTS INC.Inventors: Rustam Yevtukhov, Boris L. Druz, Viktor Kanarov, Alan V. Hayes
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Patent number: 8158016Abstract: Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.Type: GrantFiled: February 26, 2008Date of Patent: April 17, 2012Assignee: Veeco Instruments, Inc.Inventors: Alan V. Hayes, Rustam Yevtukhov, Viktor Kanarov, Boris L. Druz
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Patent number: 7557362Abstract: Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.Type: GrantFiled: February 26, 2007Date of Patent: July 7, 2009Assignee: Veeco Instruments Inc.Inventors: Rustam Yevtukhov, Alan V. Hayes, Viktor Kanarov, Boris L. Druz
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Patent number: 7414355Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: August 18, 2005Date of Patent: August 19, 2008Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20080179284Abstract: Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.Type: ApplicationFiled: February 26, 2008Publication date: July 31, 2008Applicant: VEECO INSTRUMENTS INC.Inventors: Alan V. Hayes, Rustam Yevtukhov, Viktor Kanarov, Boris L. Druz
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Publication number: 20070194245Abstract: Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.Type: ApplicationFiled: February 26, 2007Publication date: August 23, 2007Applicant: VEECO INSTRUMENTS INC.Inventors: Rustam Yevtukhov, Alan Hayes, Viktor Kanarov, Boris Druz
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Patent number: 7183716Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: GrantFiled: February 4, 2004Date of Patent: February 27, 2007Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Jr., Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Publication number: 20060192132Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: ApplicationFiled: August 18, 2005Publication date: August 31, 2006Inventors: Viktor Kanarov, Alan Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Patent number: 7005782Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: May 27, 2004Date of Patent: February 28, 2006Assignee: VEECO Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20040212288Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: ApplicationFiled: May 27, 2004Publication date: October 28, 2004Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20040163766Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: ApplicationFiled: February 4, 2004Publication date: August 26, 2004Applicant: Veeco Instruments Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Patent number: 6774550Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: April 14, 2003Date of Patent: August 10, 2004Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20030184206Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: ApplicationFiled: April 13, 2003Publication date: October 2, 2003Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Patent number: 6590324Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: September 7, 1999Date of Patent: July 8, 2003Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch