Patents by Inventor Rutger MEYER TIMMERMAN THIJSSEN

Rutger MEYER TIMMERMAN THIJSSEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200233125
    Abstract: Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
    Type: Application
    Filed: February 9, 2020
    Publication date: July 23, 2020
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph Olson, Peter Kurunczi, Robert Masci
  • Patent number: 10707118
    Abstract: Systems and methods herein are related to the formation of optical devices including stacked optical element layers using silicon wafers, glass, or devices as substrates. The optical elements discussed herein can be fabricated on temporary or permanent substrates. In some examples, the optical devices are fabricated to include transparent substrates or devices including charge-coupled devices (CCD), or complementary metal-oxide semiconductor (CMOS) image sensors, light-emitting diodes (LED), a micro-LED (uLED) display, organic light-emitting diode (OLED) or vertical-cavity surface-emitting laser (VCSELs). The optical elements can have interlayers formed in between optical element layers, where the interlayers can range in thickness from 1 nm to 3 mm.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: July 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ludovic Godet, Wayne McMillan, Rutger Meyer Timmerman Thijssen, Naamah Argaman, Tapashree Roy, Sage Doshay
  • Patent number: 10690821
    Abstract: Methods of producing gratings with trenches having variable height and width are provided. In one example, a method includes providing an optical grating layer atop a substrate, and providing a patterned hardmask over the optical grating layer. The method may include forming a mask over just a portion of the optical grating layer and the patterned hardmask, and etching a plurality of trenches into the optical grating layer to form an optical grating. After trench formation, at least one of the following grating characteristics varies between one or more trenches of the plurality of trenches: a trench depth and a trench width.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: June 23, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Megan Clark
  • Patent number: 10690808
    Abstract: Aspects disclosed herein relate to color filters for display devices, and more specifically to color filters for transmitting or reflecting and recycling colors of light in liquid crystal display devices. In one aspect, a metasurface is formed between two polarizers in an LCD device. In another aspect, a metasurface is formed on a white light guide of an LCD device. The metasurface is formed to transmit desired color(s) of light and to reflect undesired color(s) of light back into the light guide to be recycled and passed through the LCD device elsewhere. Using the color filter to recycle reflected colors of light increases the efficiency of the display device, such as the LCD device.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: June 23, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rutger Meyer Timmerman Thijssen, Robert Jan Visser, Tapashree Roy
  • Publication number: 20200192009
    Abstract: Methods of producing gratings with trenches having variable height and width are provided. In one example, a method includes providing an optical grating layer atop a substrate, and providing a patterned hardmask over the optical grating layer. The method may include forming a mask over just a portion of the optical grating layer and the patterned hardmask, and etching a plurality of trenches into the optical grating layer to form an optical grating. After trench formation, at least one of the following grating characteristics varies between one or more trenches of the plurality of trenches: a trench depth and a trench width.
    Type: Application
    Filed: March 11, 2019
    Publication date: June 18, 2020
    Applicant: APPLIED Materials, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Megan Clark
  • Publication number: 20200190658
    Abstract: Embodiments of the disclosure relate to systems and methods for forming devices on a substrate. For example, a method for forming devices on a substrate can include projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a first surface of a substrate and projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a second surface of a substrate. In these embodiments, the first surface and the second surface are on opposite sides of the substrate. Therefore, the ion beams can form the devices on both sides of the substrate.
    Type: Application
    Filed: December 6, 2019
    Publication date: June 18, 2020
    Inventors: Joseph C. OLSON, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN, Morgan EVANS, Jinxin FU
  • Publication number: 20200192028
    Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Inventors: Ludovic GODET, Joseph C. OLSON, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200192010
    Abstract: Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area.
    Type: Application
    Filed: December 16, 2019
    Publication date: June 18, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Joseph C. OLSON, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN, Morgan EVANS, Jinxin FU
  • Publication number: 20200194217
    Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Inventors: Ludovic GODET, Joseph C. OLSON, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200192031
    Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Inventors: Morgan EVANS, Joseph C. OLSON, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200192027
    Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Inventors: Kartik RAMASWAMY, Yang YANG, Manivannan THOTHADRI, Chien-An CHEN, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200194227
    Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.
    Type: Application
    Filed: December 5, 2019
    Publication date: June 18, 2020
    Inventors: Joseph C. OLSON, Morgan EVANS, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200195172
    Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.
    Type: Application
    Filed: December 13, 2019
    Publication date: June 18, 2020
    Inventors: Wayne MCMILLAN, Visweswaren SIVARAMAKRISHNAN, Joseph C. OLSON, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN, Naamah ARGAMAN
  • Publication number: 20200194228
    Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.
    Type: Application
    Filed: December 5, 2019
    Publication date: June 18, 2020
    Inventors: Joseph C. OLSON, Morgan EVANS, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200194218
    Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Inventors: Ludovic GODET, Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Yang Yang, Manivannan Thothadri, Chien-An Chen
  • Publication number: 20200194319
    Abstract: Embodiments described herein relate to semiconductor processing. More specifically, embodiments described herein relate to processing of transparent substrates. A film is deposited on a backside of the transparent substrate. A thickness of the film is determined such that the film reflects particular wavelengths of light and substantially prevents bowing of the substrate. The film provides constructive interference to the particular wavelengths of light.
    Type: Application
    Filed: October 25, 2019
    Publication date: June 18, 2020
    Inventors: Sage Toko Garrett DOSHAY, Rutger MEYER TIMMERMAN THIJSSEN, Ludovic GODET, Mingwei ZHU, Naamah ARGAMAN, Wayne MCMILLAN, Siddarth KRISHNAN
  • Publication number: 20200194215
    Abstract: Embodiments herein provide systems and methods for multi-area selecting etching. In some embodiments, a system may include a plasma source delivering a plurality of angled ion beams to a substrate, the substrate including a plurality of devices. Each of the plurality of devices may include a first angled grating and a second angled grating. The system may further include a plurality of blocking masks positionable between the plasma source and the substrate. A first blocking mask of the plurality of blocking masks may include a first set of openings permitting the angled ion beams to pass therethrough to form the first angled gratings of each of the plurality of devices. A second blocking mask of the plurality of blocking masks may include a second set of openings permitting the angled ion beams to pass therethrough to form the second angled gratings of each of the plurality of devices.
    Type: Application
    Filed: March 1, 2019
    Publication date: June 18, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen
  • Publication number: 20200166783
    Abstract: Embodiments of metasurfaces having nanostructures with desired geometric profiles and configurations are provided in the present disclosure. In one embodiment, a metasurface includes a nanostructure formed on a substrate, wherein the nanostructure is cuboidal or cylindrical in shape. In another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein each of the nanostructures has a gap greater than 35 nm spaced apart from each other. In yet another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein the nanostructures are fabricated from at least one of TiO2, silicon nitride, or amorphous silicon, or GaN or aluminum zinc oxide or any material with refractive index greater than 1.8, and absorption coefficient smaller than 0.001, the substrate is transparent with absorption coefficient smaller than 0.001.
    Type: Application
    Filed: October 14, 2019
    Publication date: May 28, 2020
    Inventors: Tapashree ROY, Wayne MCMILLAN, Rutger MEYER TIMMERMAN THIJSSEN
  • Publication number: 20200166681
    Abstract: Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
    Type: Application
    Filed: January 31, 2020
    Publication date: May 28, 2020
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph Olson, Peter Kurunczi, Robert Masci
  • Publication number: 20200158495
    Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.
    Type: Application
    Filed: January 4, 2019
    Publication date: May 21, 2020
    Applicant: APPLIED Materials, Inc.
    Inventors: Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Morgan Evans