Patents by Inventor Rutger Schlatmann

Rutger Schlatmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9899555
    Abstract: A method for producing a rear-side contact system for a silicon thin-film solar cell having a pn junction formed from a silicon absorber layer and an emitter layer includes applying an organic insulation layer to the emitter layer; producing contact holes in the insulation layer as far as the absorber layer and the emitter layer; subsequently insulating the contact holes; subsequently applying a low-melting metal layer to form n and p contacts in the contact holes; separating the metal layer into n-contacting and p-contacting regions by laser-cutting; before applying the organic insulation layer to the emitter layer, applying a TCO layer; producing holes for contacts for the silicon absorber layer in the organic insulation; and subsequently selectively doping the produced holes for the contacts as far as the silicon absorber layer.
    Type: Grant
    Filed: July 21, 2015
    Date of Patent: February 20, 2018
    Assignee: HELMHOLTZ-ZENTRUM BERLIN FUER MATERIALIEN UND ENERGIE GMBH
    Inventors: Sven Ring, Moshe Weizman, Holger Rhein, Christof Schultz, Frank Fink, Stefan Gall, Rutger Schlatmann
  • Publication number: 20170236965
    Abstract: A method for producing a rear-side contact system for a silicon thin-film solar cell having pn junction formed from a silicon absorber layer and an emitter layer includes applying an organic insulation layer to the emitter layer; producing contact holes in the insulation layer as far as the absorber layer and the emitter layer; subsequently insulating the contact holes; subsequently applying a low-melting metal layer to form n and p contacts in the contact holes; separating the metal layer into n-contacting and p-contacting regions by laser-cutting; before applying the organic insulation layer to the emitter layer, applying a TCO layer; producing holes for contacts for the silicon absorber layer in the organic insulation; and subsequently selectively doping the produced holes for the contacts as far as the silicon absorber layer.
    Type: Application
    Filed: July 21, 2015
    Publication date: August 17, 2017
    Inventors: Sven Ring, Moshe Weizman, Holger Rhein, Christof Schultz, Frank Fink, Stefan Gall, Rutger Schlatmann
  • Patent number: 8025929
    Abstract: The invention pertains to a method for preparing a flexible mechanically compensated layered material comprising a transparent carrier both sides of which are at least partly covered with a transparent inorganic material, comprising the consecutive steps of a) providing two temporary substrates; b) applying a transparent inorganic material layer onto each of the temporary substrates; c1) applying a transparent carrier onto the transparent inorganic material layers; or c2) applying a polymerizable precursor for a transparent polymerized carrier onto the transparent inorganic material layers followed by polymerizing the polymerizable precursor to the transparent carrier; and d) removing the temporary substrates.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: September 27, 2011
    Assignee: Helianthos B.V.
    Inventors: Gert Jan Jongerden, Rutger Schlatmann, Jan Willem Gaston Mahy
  • Publication number: 20080193717
    Abstract: The invention pertains to a method for preparing a flexible mechanically compensated layered material comprising a transparent carrier both sides of which are at least partly covered with a transparent inorganic material, comprising the consecutive steps of a) providing two temporary substrates; b) applying a transparent inorganic material layer onto each of the temporary substrates; c1) applying a transparent carrier onto the transparent inorganic material layers; or c2) applying a polymerizable precursor for a transparent polymerized carrier onto the transparent inorganic material layers followed by polymerizing the polymerizable precursor to the transparent carrier; and d) removing the temporary substrates.
    Type: Application
    Filed: November 17, 2005
    Publication date: August 14, 2008
    Applicant: Akzo Nobel N.V.
    Inventors: Gert Jan Jongerden, Rutger Schlatmann, Jan Mahy
  • Patent number: 5551587
    Abstract: A method of manufacturing multilayer mirrors for use in conjunction with X-rays. Customary multilayer mirrors are composed of discrete, thin layers which generally consist of alternating absorption and spacer layers. In order to counteract surface roughness of the thin layers, it is known to smoothen the layers by ion etching after deposition. A drawback thereof consists in that the material of one layer penetrates into the other layer, so that the location of the interface and the thickness of the layers of the multilayer mirror are no longer suitably defined. In accordance with the invention, a multilayer mirror is manufactured by stimulating the penetration of one of the materials into the layer with the other material, after which the original layer thickness of the first material is removed by etching.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: September 3, 1996
    Assignee: U.S. Philips Corporation
    Inventors: Anton Keppel, Rutger Schlatmann, Jan Verhoeven