Patents by Inventor Ruth M. Cuzmar

Ruth M. Cuzmar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive working polyamic acid/imide photoresist compositions and their use as dielectrics
    Patent number: 5336925
    Abstract: Positive working polyamic acid photoresist compositions are disclosed having improved high resolution upon image development and exhibiting stable photosensitivity and superior dielectric performance. The compositions comprise polyamic acid condensation products of an aromatic dianhydride and an aromatic di-primary amine wherein a percentage of the diamine comprises special dissolution inhibiting monomers. The compositions may be further improved by the presence of particular supplemental additives.
    Type: Grant
    Filed: January 29, 1992
    Date of Patent: August 9, 1994
    Assignee: Brewer Science, Inc.
    Inventors: Mary G. Moss, Terry Brewer, Ruth M. Cuzmar, Dan W. Hawley, Tony D. Flaim
  • Positive working polyamic acid/imide photoresist compositions and their use as dielectrics
    Patent number: 5138424
    Abstract: Positive working polyamic acid photoresist compositions are disclosed having improved high resolution upon image development and exhibiting stable photosensitivity and superior dielectric performance. The compositions comprise polyamic acid condensation products of an aromatic dianhydride and an aromatic di-primary amine wherein a percentage of the diamine comprises special dissolution inhibiting monomers. The compositions may be further improved by the presence of particular supplemental additives.
    Type: Grant
    Filed: October 31, 1990
    Date of Patent: August 11, 1992
    Assignee: Brewer Science, Inc.
    Inventors: Mary G. Moss, Terry Brewer, Ruth M. Cuzmar, Dan W. Hawley, Tony D. Flaim
  • Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake
    Patent number: 5024922
    Abstract: Positive working polyamic acid photoresist compositions are disclosed having improved high resolution upon image development and exhibiting stable photosensitivity and superior dielectric performance. The compositions comprise polyamic acid condensation products of an aromatic dianhydride and an aromatic di-primary amine wherein a percentage of the diamine comprises special dissolution inhibiting monomers. The compositions may be further improved by the presence of particular supplemental additives.
    Type: Grant
    Filed: November 7, 1988
    Date of Patent: June 18, 1991
    Inventors: Mary G. Moss, Terry Brewer, Ruth M. Cuzmar, Dan W. Hawley, Tony D. Flaim