Abstract: A computing device includes: a housing having a plurality of sides defining a housing interior; a first outer lens disposed on a first side of the housing; a second outer lens disposed on a second side of the housing; an image sensor in the housing interior, the image sensor having first and second capture regions; an optical divider in the housing interior, the optical divider configured to (i) direct light from the first outer lens along a first optical path, and (ii) direct light from the second outer lens along a second optical path; and a lens assembly between the optical divider and the image sensor, the lens assembly configured to (i) focus light received along the first optical path onto the first capture region of the image sensor, and (ii) focus light received along the second optical path onto the second capture region of the image sensor.

Abstract: A method is provided for selectively placing catalytic nanoparticles (22) for growing one dimensional structures (28) including nanotubes and nanowires. The method comprises providing a solution (23) including a plurality of catalytic nanoparticles (28) suspended therein. An alternating current is applied between two electrodes (12, 14) submersed in the solution (23), thereby positioning the plurality of catalytic nanoparticles (22) contiguous to the two electrodes (12, 14). A one dimensional nanostructure (28) is then grown from each of the catalytic nanoparticles (22).

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.