Patents by Inventor Ruud Hendricus Martinus Johannes Bloks

Ruud Hendricus Martinus Johannes Bloks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and a device manufacturing method
    Patent number: 10191377
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands, B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
  • LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20170212421
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Application
    Filed: April 7, 2017
    Publication date: July 27, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus JACOBS, Gerardus Adrianus Antonius Maria KUSTERS, Thibault Simon Mathieu LAURENT, Marcio Alexandre Cano MIRANDA, Ruud Hendricus Martinus Johannes BLOKS, Peng FENG, Johan Gertrudis Cornelis KUNNEN
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20120013865
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendricus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20110181849
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Application
    Filed: January 20, 2011
    Publication date: July 28, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110005603
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
  • Lithographic apparatus and a device manufacturing method
    Patent number: RE49297
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: November 15, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen