Patents by Inventor Ruud Hendrikus Martinus Johannes Bloks

Ruud Hendrikus Martinus Johannes Bloks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table
    Patent number: 9618858
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: April 11, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendrikus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
  • LITHOGRAPHIC APPARATUS
    Publication number: 20170068175
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Application
    Filed: November 17, 2016
    Publication date: March 9, 2017
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
  • Lithographic apparatus
    Patent number: 9513568
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: December 6, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20160202618
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: March 23, 2016
    Publication date: July 14, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria KUSTERS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Takeshi KANEKO, Robbert Jan VOOGD, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Johan Gertrudis Cornelis KUNNEN, Ramin BADIE
  • Lithographic apparatus and method
    Patent number: 9298107
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: March 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • LITHOGRAPHIC APPARATUS
    Publication number: 20150168854
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Application
    Filed: June 5, 2013
    Publication date: June 18, 2015
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
  • OBJECT HOLDER AND LITHOGRAPHIC APPARATUS
    Publication number: 20150131064
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Application
    Filed: May 7, 2013
    Publication date: May 14, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8472003
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: June 25, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
  • FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20130050665
    Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.
    Type: Application
    Filed: August 22, 2012
    Publication date: February 28, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
  • LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20130045447
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Application
    Filed: August 15, 2012
    Publication date: February 21, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks