Patents by Inventor Ruzhi Wang

Ruzhi Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220289788
    Abstract: Provided in the present invention are a 3-hydroxyl-5-pregnane-20-one derivative as shown in formula I or a pharmaceutically acceptable salt thereof, and a pharmaceutical composition comprising the derivative or the pharmaceutically acceptable salt thereof. The derivative or the pharmaceutically acceptable salt thereof or the pharmaceutical composition comprising the above-mentioned derivative or salt of the present invention can be used to prepare a drug for treating a disease caused by abnormalities in the central nervous system.
    Type: Application
    Filed: August 7, 2020
    Publication date: September 15, 2022
    Inventors: Fei LIU, Gang WU, Chenggang LIN, Xiaobo WANG, Xiaoqiang WANG, Ruzhi WANG, Bin ZHU, Kongchao XU, Xiaoyan SUN, Jun CAI, Lin WANG, Weihua JIANG, Minqiang ZHENG
  • Publication number: 20210109426
    Abstract: A clamping device for mounting a mobile terminal device to a hot shoe of an image photographing apparatus includes a quick release structure and a clamping assembly. The quick release structure includes a cold shoe fixing piece for connecting to a quick release interface of the hot shoe, and a first locking structure for selectively quickly locking the cold shoe fixing piece to the hot shoe, or quickly unlocking the cold shoe fixing piece from the hot shoe. The clamping assembly is configured to clamp the mobile terminal device, so that the mobile terminal device can be mounted, together with the quick release structure, to a quick release interface of the image photographing apparatus along with the clamping device. This facilitates quick and reliable mounting of the mobile terminal device to the image photographing apparatus, and quick removal of the mobile terminal device from the image photographing apparatus.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Applicant: SZ DJI TECHNOLOGY CO., LTD.
    Inventors: Shimeng Bei, Ruzhi Wang
  • Publication number: 20210072491
    Abstract: A follow focus device for a gimbal carrying an image capturing device includes a power assembly connected to the image capturing device, a connection member, and an adjustment member electrically connected to the power assembly. The power assembly is configured to adjust at least one lens parameter of the image capturing device. The connection member is configured to fix the power assembly to the gimbal. The adjustment member generates a control signal to adjust the lens parameter of the image capturing device. The power assembly receives the control signal from the adjustment member and, based on the control signal, rotates a part of the image capturing device to adjust the lens parameter of the image capturing device.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Inventors: Ruzhi WANG, Hao WANG, Paul PAN, Weidong LI
  • Patent number: 8704445
    Abstract: A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: April 22, 2014
    Assignee: Beijing University of Technology
    Inventors: Bo Wang, Lichun Xu, Ming Zhang, Ruzhi Wang, Xuemei Song, Yudong Hou, Mankang Zhu, Jingbing Liu, Hao Wang, Hui Yan
  • Publication number: 20130285551
    Abstract: A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.
    Type: Application
    Filed: June 18, 2012
    Publication date: October 31, 2013
    Applicant: BEIJING UNIVERSITY OF TECHNOLOGY
    Inventors: Bo Wang, Lichun Xu, Ming Zhang, Ruzhi Wang, Xuemei Song, Yudong Hou, Mankong Zhu, Jingbing Liu, Hao Wang, Hui Yan