Patents by Inventor Ruzhi Zhang

Ruzhi Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7390430
    Abstract: Difunctional oxazoline resins, which may be produced in a convenient one-step reaction from an arylalkylene dinitrile by reaction with an amino alcohol, are used in compositions with an additional curable compound or resin containing one or more carbon to carbon double bonds. The composition can be cured to a thermoset material, the curing mechanism occurring by the zwitterion polymerization of the bisoxazoline resin with the resin containing the one or more carbon to carbon double bonds. The reaction occurs without the need for curing initiators.
    Type: Grant
    Filed: February 17, 2004
    Date of Patent: June 24, 2008
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Osama M. Musa, Ruzhi Zhang
  • Publication number: 20080096125
    Abstract: The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
    Type: Application
    Filed: October 18, 2006
    Publication date: April 24, 2008
    Inventors: Woo-Kyu Kim, Hengpeng Wu, David Abdallah, Mark Neisser, PingHung Lu, Ruzhi Zhang, M. Dalil Rahman
  • Patent number: 7326754
    Abstract: This invention is a film adhesive prepared from an adhesive composition comprising a polymer system, a film forming rubber compound, and curing agents for the polymeric system. The polymer system comprises a base polymer and electron donor and electron acceptor functionality.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: February 5, 2008
    Inventors: Nikola A. Nikolic, Ruzhi Zhang, Osama M. Musa, Hwail Jin, Bing Wu, David Shenfield
  • Publication number: 20080008954
    Abstract: High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed.
    Type: Application
    Filed: June 22, 2006
    Publication date: January 10, 2008
    Inventors: David J. Abdallah, Ruzhi Zhang
  • Publication number: 20070298349
    Abstract: The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W? are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W? and W, or L and W? are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
    Type: Application
    Filed: June 22, 2006
    Publication date: December 27, 2007
    Inventors: Ruzhi Zhang, Mark O. Neisser, Woo-Kyu Kim, David J. Abdallah, Francis Houlihan, Ping-Hung Lu, Hong Zhuang
  • Publication number: 20070212556
    Abstract: A polymer is prepared from monomers containing at least one carbon to carbon double bond and at least one siloxane moiety and from monomers containing at least one carbon to carbon double bond and at least one moiety that imparts reactivity to the resulting polymer. Siloxane moieties impart permeability; reactivity is obtained from monomers containing epoxy, oxetane, oxazoline, benzoxazine, or episulfide functionality. Additional properties can be added to the polymer by the inclusion in the initial polymerization mix of monomers that impart low glass transition temperature, high glass transition temperature, and adhesion. The level of each functionality can be controlled by the practitioner by varying the amount of monomer containing that functionality added to the initial polymerization. These materials can be B-staged.
    Type: Application
    Filed: March 7, 2006
    Publication date: September 13, 2007
    Inventors: Osama Musa, Ruzhi Zhang, Kevin Becker, Luke Zannoni
  • Publication number: 20070032578
    Abstract: Difunctional oxazoline resins, which may be produced in a convenient one-step reaction from an arylalkylene dinitrile by reaction with an amino alcohol, are used in compositions with an additional curable compound or resin containing one or more carbon to carbon double bonds. The composition can be cured to a thermoset material, the curing mechanism occurring by the zwitterion polymerization of the bisoxazoline resin with the resin containing the one or more carbon to carbon double bonds. The reaction occurs without the need for curing initiators.(I).
    Type: Application
    Filed: February 17, 2004
    Publication date: February 8, 2007
    Inventors: Osama Musa, Ruzhi Zhang
  • Publication number: 20060030672
    Abstract: This invention is a film adhesive prepared from an adhesive composition comprising a polymer system, a film forming rubber compound, and curing agents for the polymeric system. The polymer system comprises a base polymer and electron donor and electron acceptor functionality.
    Type: Application
    Filed: October 12, 2005
    Publication date: February 9, 2006
    Inventors: Nikola Nikolic, Ruzhi Zhang, Osama Musa, Hwail Jin, Bing Wu
  • Publication number: 20060025509
    Abstract: Benzoxazine compounds can be cured with epoxies and fluxing agents to afford thermoset materials with particular utility as no-flow underfilling encapsulants within the semiconductor packaging industry.
    Type: Application
    Filed: July 29, 2004
    Publication date: February 2, 2006
    Inventors: Ruzhi Zhang, Osama Musa, Mark Bonneau
  • Publication number: 20050137340
    Abstract: This invention is a film adhesive prepared from an adhesive composition comprising a polymer system, a film forming rubber compound, and curing agents for the polymeric system. The polymer system comprises a base polymer and electron donor and electron acceptor functionality.
    Type: Application
    Filed: January 27, 2005
    Publication date: June 23, 2005
    Inventors: Nikola Nikolic, Ruzhi Zhang, Osama Musa, Hwail Jin, Bing Wu, David Shenfield
  • Publication number: 20030232926
    Abstract: This invention is a film adhesive prepared from an adhesive composition comprising a polymer system, a film forming rubber compound, and curing agents for the polymeric system. The polymer system comprises a base polymer and electron donor and electron acceptor functionality.
    Type: Application
    Filed: May 14, 2002
    Publication date: December 18, 2003
    Inventors: Nikola A. Nikolic, Ruzhi Zhang, Osama M. Musa, Hwail Jin, Bing Wu, David Shenfield